| Co3(HHTP)2 2D computational modelresearch_0417__mat__mat_co_hhtp2_model | Model · Model System · Model | DFT high-spin model2D model | p008 / SI page 8 · Band Structure Calculations · Figure 9 |
| Cu3(HHTP)2 bulk computational modelresearch_0417__mat__mat_cu_hhtp2 | Model · Model System · Model | DFT high-spin bulk model3D ABAB stacked model | p007 / SI page 7 · Band Structure Calculations · Figure 6 |
| Cu3(HHTP)2 monolayer computational modelresearch_0417__mat__mat_cu_hhtp2 | Model · Model System · Model | DFT high-spin monolayer model with D6h symmetrysingle plane / monolayer | p004 / 6192 · Results · Fig. 3 |
| Cu3(HHTP)2 SURMOF with 100 nm lithographic 4-terminal contactsresearch_0417__mat__mat_cu_hhtp2 | Thin Film · Target Sample · Pristine Framework | Optimised SURMOF processed by PMMA electron-beam lithography, Cr/Au contact evaporation and lift-offSiO2/Si · 650 nm for short-channel electron-beam lithography sample | p005 / SI Experimental 2.3 · Conductivity measurement · Fig. 4, Fig. S6, Fig. S7 |
| Cu3(HHTP)2 SURMOF with 100 um shadow-mask Au contact spacingresearch_0417__mat__mat_cu_hhtp2 | Thin Film · Target Sample · Pristine Framework | Optimised SURMOF contacted with 45 nm Au pads evaporated through a shadow maskSiO2/Si · 620 nm for long-channel shadow mask sample | p005 / SI Experimental 2.3 · Conductivity measurement · Fig. S4 and Fig. S5 |
| Cu3(HHTP)2 SURMOF with 15 um contact spacingresearch_0417__mat__mat_cu_hhtp2 | Thin Film · Target Sample · Pristine Framework | Optimised SURMOF measured with reduced electrode spacingSiO2/Si · not separately reported; long-channel family | p010 / SI Fig. S5 · Figure captions · Figure S5 |
| Non-optimised Cu3(HHTP)2 SURMOFresearch_0417__mat__mat_cu_hhtp2 | Thin Film · Pristine Control · Pristine Framework | Initial, non-optimised deposition conditionnot specified | p008 / SI Fig. S2 · Figure captions · Figure S2 |
| Optimised Cu3(HHTP)2 SURMOF thin filmresearch_0417__mat__mat_cu_hhtp2 | Thin Film · Target Sample · Pristine Framework | ML-optimised robotic layer-by-layer SURMOF grown in nitrogen gloveboxSiO2/Si substrate unless otherwise specified · around 600 nm; SEM 602 +/- 74 nm; AFM glass sample 648 +/- 67 nm | p003 / 6191 · Results · Table S1 and Fig. S1 referenced |
| Ni3(HHTP)2 2D computational modelresearch_0417__mat__mat_ni_hhtp2_model | Model · Model System · Model | DFT high-spin model2D model | p008 / SI page 8 · Band Structure Calculations · Figure 8 |