Electrical Transport

4-point probe method

CuI(1A2P) film on glass · Thin Film

Sheet resistance and volume resistivity of CuI films after heating at 150 deg C; concentrations varied.

Geometry: thin films on glass; 4-point probe Kyowariken K-705RS
Context: Pristine CuI films from multiple precursor routes.
Measurement source: 3 · 2.4 Characterization

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
CuI(1A2P) volume resistivity at 0.26 MMarked as a best value within this paper	0.92 x 10^-1 Ohm cm	—	—	Text Exact Reported	6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3
CuI(1A2P) volume resistivity at 0.35 M	1.16 x 10^-1 Ohm cm	—	—	Text Exact Reported	6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3
CuI(1A2P) volume resistivity at 0.50 M	1.37 x 10^-1 Ohm cm	—	—	Text Exact Reported	6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3
CuI(1A2P) sheet resistance at 0.26 M	15.4 +/- 3.07 kOhm/sq	—	+/- 3.07 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3d
CuI(1A2P) sheet resistance at 0.35 M	12.3 +/- 0.91 kOhm/sq	—	+/- 0.91 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3d
CuI(1A2P) sheet resistance at 0.50 MMarked as a best value within this paper	10.0 +/- 0.90 kOhm/sq	—	+/- 0.90 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3d
CuI(2AE) sheet resistance at 0.26 M	11.9 +/- 1.10 kOhm/sq	—	+/- 1.10 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3c
CuI(2AE) sheet resistance at 0.35 M	18.6 +/- 2.83 kOhm/sq	—	+/- 2.83 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3c
CuI(2AE) sheet resistance at 0.50 M	40.7 +/- 3.83 kOhm/sq	—	+/- 3.83 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3c
CuI(2AE) sheet resistance at 0.70 M	35.3 +/- 2.33 kOhm/sq	—	+/- 2.33 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3c
CuI(DES) sheet resistance at 0.50 M	207.2 +/- 56.5 kOhm/sq	—	+/- 56.5 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3b
CuI(DES) sheet resistance at 0.70 M	44.8 +/- 14.6 kOhm/sq	—	+/- 14.6 kOhm/sq	Figure Axis Uncertain	4 · 3.2 Fabrication of CuI film on glass substrate · Fig. 3b

Hall effect measurement using TKS-HE-1000-20 mm-C

Hall-effect measurements

CuI(1A2P) film on glass · Thin Film

Prepared CuI thin film, thickness 94 nm.

Geometry: thin film on glass
Context: Pristine target CuI(1A2P) film.
Measurement source: 7 · 3.5 Physical properties of CuI thin films · Fig. 7a

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Carrier densityMarked as a best value within this paper	6.38 x 10^19 cm^-3	—	—	Text Exact Reported	7 · 3.5 Physical properties of CuI thin films · Fig. 7a
Electrical conductivityMarked as a best value within this paper	9.35 S cm^-1	—	—	Text Exact Reported	1 · Abstract
MobilityMarked as a best value within this paper	0.96 cm^2 V^-1 s^-1	—	—	Text Exact Reported	7 · 3.5 Physical properties of CuI thin films · Fig. 7a
Hall-effect volume resistance	1.07 x 10^-1 Ohm cm	—	—	Text Exact Reported	7 · 3.5 Physical properties of CuI thin films · Fig. 7a

Bending-angle electrical resistance test

CuI(1A2P) film on PET · Thin Film

CuI(1A2P) film on PET; resistance compared during bending from 180 deg to 30 deg.

Geometry: flexible PET thin film
Context: Pristine CuI film on flexible substrate.
Measurement source: SI p015 · 3.4 Fabrication of CuI thin films on FTO and PET substrates · Supplementary Fig. S19

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
PET CuI resistance ratio trend on bending	resistance ratio gradually increases from 180 deg to 30 deg	—	—	Text Qualitative	SI p015 · 3.4 Fabrication of CuI thin films on FTO and PET substrates · Supplementary Fig. S19

3 measurement groups · 17 results