Microscopy Morphology — Three-type precursors for low-temperature solution-processed void-and-crack-free copper(I) iodide films: comparison of electrical conductivities and optical transparency

Measurement evidence

Microscopy Morphology

Three-type precursors for low-temperature solution-processed void-and-crack-free copper(I) iodide films: comparison of electrical conductivities and optical transparency · Ishizaki M., Koya N., Gotoh Y. et al. · Bulletin of the Chemical Society of Japan · 2024 · uoae071

3 measurement groups · 6 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Cross-sectional FE-SEM and stylus thickness profiler

CuI(1A2P) film on glass · Thin Film

CuI(1A2P) films on glass prepared from 0.13, 0.26, 0.35 and 0.50 M precursor solutions after heating to 150 deg C.

Geometry
thin film on glass
Context
Pristine target CuI(1A2P) film.
Measurement source
6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 5
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
CuI(1A2P) thickness at 0.13 Mapproximately 45 nm from Fig. 5bFigure Axis
Approximate
6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 5b
CuI(1A2P) thickness at 0.26 Mapproximately 60 nm from Fig. 5bFigure Axis
Approximate
6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 5b
CuI(1A2P) thickness at 0.35 M94 nmText
Exact Reported
7 · 3.5 Physical properties of CuI thin films · Supplementary Fig. S21
CuI(1A2P) thickness at 0.50 Mapproximately 138 nm from Fig. 5bFigure Axis
Approximate
6 · 3.2 Fabrication of CuI film on glass substrate · Fig. 5b
CuI(1A2P) void-and-crack-free thickness thresholdMarked as a best value within this paper>50 nmText
Approximate
1 · Abstract

XRD plus top-view and cross-section SEM

CuI(1A2P) film on FTO · Thin Film

CuI(1A2P) films on FTO glass substrate using 0.13, 0.26, 0.35 and 0.50 M precursor solutions.

Geometry
thin film on FTO glass
Context
Pristine CuI layer on conductive FTO substrate for HTL-relevance assessment.
Measurement source
SI p014 · Supporting Information · Figs. S17-S18
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
FTO complete coverage threshold with 1A2P precursorMarked as a best value within this paperover 0.26 MText
Approximate
6 · 3.4 Fabrication of CuI thin films on FTO and PET substrates · Supplementary Fig. S18

Laser microscopy

CuI(1A2P) film on glass · Thin Film

Films prepared using 0.13 M AN or DES precursor and 0.26 M 2AE or 1A2P precursor, observed after heat treatment from room temperature to 150 deg C.

Geometry
thin films on glass
Context
Comparison of precursor-dependent morphology.
Measurement source
5 · 3.2 Fabrication of CuI film on glass substrate · Fig. 4
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource