TEM, HRTEM, DF-STEM-EDS, SAED, and AFM
Co-TCPP-Ac NSs · Nanosheet
TEM/EDS on JEOL instruments at 200 kV; AFM on Cypher, Asylum Research.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| AFM height-profile RMS roughness | Rms = 1.2 nm | 1.2 nm | — | Figure Axis Rounded Reported | 6 · figure · Fig. S2d |
| HRTEM lattice spacing assigned to (021) | ~1.2 nm | 1.2 nm | ~ | Text Approximate | 3 · main text · Fig. 2c |
| Average nanosheet thicknessMarked as a best value within this paper | 10 +/- 2 nm | 10 nm | +/- 2 nm | Text Rounded Reported | 2 · main text · Fig. S2b-d |
| SAED assigned planes | (100) and (110) planes | — | — | Text Qualitative | 2 · main text · Fig. 2b |