Partial recipeSource: Main
Route 1: Other
2 · 2.1 Microelectrodes fabrication · Fig. 1
Metal precursorsCr and Au deposited as microelectrodes
Solventsiso-propyl alcohol for wafer cleaning
Atmospherevacuum atmosphere for deposition
Temperature110
Substrate orientationSi/SiO2 wafer; highly boron doped p-type Si, 525 um; SiO2 100 nm
Work-upWafers cleaned by iso-propyl alcohol and pre-baked at 110 C for dehydration.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Solvent | Iso-propyl alcohol | Not specified | 2 · 2.1 Microelectrodes fabrication · Fig. 1 |
| Other | chromium | 20 nm thickness | 2 · 2.1 Microelectrodes fabrication · Fig. 1 |
| Other | gold | 180 nm thickness | 2 · 2.1 Microelectrodes fabrication · Fig. 1 |