Complete recipeSource: Main
Route 1: Liquid Liquid Interface
p002 / 2 · Experimental, Device fabrication
Metal precursorsCopper(ii) nitrate hydrate; 5 mL Cu(NO3)2 aqueous solution, 5 mM
Linker precursorsBenzenehexathiol (BHT, 95%); 20 mL BHT ethyl acetate solution, 0.24 mM
SolventsDeionised water, acetone, alcohol, isopropanol, ethyl acetate; polyethylene glycol aqueous solution
AdditivesPolyethylene glycol (PEG, average Mn = 6000), 45 mL aqueous solution at 25 mg/mL
AtmosphereAmbient environment
Temperature60 deg C drying step; film growth at ambient temperature (not numerically specified)
Time0.5 h to observe transparent interfacial film; 24 h reaction before draining; substrate solvent-cleaning steps 30 min each; UV-ozone 30 min
Substrate orientationUV-treated glass substrate positioned at a certain height in a flow beaker, with liquid surface slightly above the glass substrate
Oxidant / reductantCu2+ and BHT redox during framework formation; authors state two equivalents of Cu2+ are reduced to Cu+ and BHT is oxidised to the -4 state
Work-upAfter 24 h aqueous and organic reaction solutions were drained, leaving Cu-BHT film on glass; films rinsed several times with ethyl acetate and deionised water.
ActivationNo activation reported; films used after rinsing and Ag electrode deposition.
Scalability contextAuthors describe large-area film preparation as a challenge and state this interfacial growth simplifies preparation; no scaled batch size beyond a 2 x 2 cm substrate is demonstrated.
Show 9 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Metal Source | Copper(ii) nitrate hydrate / Cu(NO3)2 aqueous solution | 5 mL · 5 mM | p002 / 2 · Experimental, Device fabrication |
| Linker | benzenehexathiol (BHT, 95%, C6H6S6) in ethyl acetate | 20 mL · 0.24 mM | p002 / 2 · Experimental, Device fabrication |
| Solvent | ethyl acetate | 20 mL in BHT solution; also used for rinsing · 99% reagent listed | p002 / 2 · Experimental, Device fabrication |
| Additive | polyethylene glycol (PEG, average Mn = 6000) aqueous solution | 45 mL · 25 mg/mL | p002 / 2 · Experimental, Device fabrication |
| Solvent | deionised water | used in cleaning, aqueous phase and rinsing | p002 / 2 · Experimental, Device fabrication |
| Solvent | acetone | substrate ultrasonic cleaning for 30 min | p002 / 2 · Experimental, Device fabrication |
| Solvent | alcohol | substrate ultrasonic cleaning for 30 min | p002 / 2 · Experimental, Device fabrication |
| Solvent | isopropanol | substrate ultrasonic cleaning for 30 min | p002 / 2 · Experimental, Device fabrication |
| Other | silver electrodes | ~100 nm deposited thickness | p002 / 2 · Experimental, Device fabrication |