Primary studyCore evidenceThin Film Device

Thermally Driven Resistive Switching in Solution-Processable Thin Films of Coordination Polymers

Rana S., Prasoon A., Jha P.K. et al. · Journal of Physical Chemistry Letters · 2017 · 5008-5014

2materials
3samples
3synthesis routes
24measurements
58results
5claims and caveats

Evidence map

Open a family to keep every result attached to its sample, method and conditions.

Author interpretations and caveats

Paraphrased for this database from the authors’ stated interpretations — never quoted verbatim — and kept separate from reported measurements.

Application RelevanceSupport assessment: High

Ag-TCNQ thin films exhibit reversible thermally driven resistive switching between HRS at 300 K and LRS at 400 K; Cu-TCNQ thin films provide a pristine control showing analogous switching at 370 K.

Caveat: Device statistics beyond cycling plots are limited; some Cu-TCNQ control values are read from SI figure labels/caption.

5011 · Main text · Figure 3 · Linked to 5 structured results

Phase AssignmentSupport assessment: High

The final Ag-TCNQ thin film is assigned as phase-I Ag-TCNQ from new PXRD peaks at 10.25, 14.5 and 21.5 degrees 2theta.

Caveat: Assignment is based on reported out-of-plane PXRD peak positions; full single-crystal/CIF data are not reported.

5009 · Main text · Figure 2b · Linked to 3 structured results

Synthesis MechanismSupport assessment: Medium

Cu-TCNQ to Ag-TCNQ transformation is interpreted as sacrificial LbL growth rather than a simple ion-exchange process.

Caveat: Mechanistic assignment is based on indirect morphology, thickness, spectroscopy and control-reaction evidence rather than in situ chemical speciation.

5010 · Main text · Figures S3-S6 referenced · Linked to 7 structured results

Transport MechanismSupport assessment: Medium

Lack of correlation between contact resistance and metal work function suggests Fermi-level pinning, possibly due to metal-induced gap states.

Caveat: Claim is inferred from three contacts and approximate resistance values.

5013 · Main text · Figure 5 · Linked to 6 structured results

Transport MechanismSupport assessment: Medium

Thermally driven switching is attributed mainly to lowering of the Schottky barrier at the metal/semiconductor interface, not bulk conductive-filament formation.

Caveat: Authors state more C-V analysis is required to conclude temperature dependency of Schottky barrier height; evidence nevertheless supports an interfacial origin.

5013 · Main text · Figure 6 · Linked to 9 structured results

Material identities

Names and aliases are kept exactly within the paper’s own identity model.

MaterialCompositionStructure contextSource
silver tetracyanoquinodimethane coordination polymerAgTCNQ / Ag-TCNQAg(I) · tetracyanoquinodimethane (TCNQ) radical anionunknown · Pristinephase-I Ag-TCNQ assigned from out-of-plane PXRD peaks5008 · Abstract
copper tetracyanoquinodimethane coordination polymerCuTCNQ / Cu-TCNQCu(I) · tetracyanoquinodimethane (TCNQ) radical anionunknown · Pristinephase-I Cu-TCNQ assigned from out-of-plane PXRD peaks5009 · Main text · Figure 2

Sample register

Sample form, processing state and composition status define the context for measurements.

Show 3 sample records
SampleForm and roleProcessing and geometrySource
Ag-TCNQ thin film on SAM/Auresearch_0654__mat__mat_ag_tcnqThin Film · Target Sample · Pristine FrameworkFinal film after 10 sacrificial LbL cycles from a preformed Cu-TCNQ filmcarboxy-terminated MUDA SAM on Au-coated silicon substrate; final Ag-TCNQ formed after sacrificial Cu-TCNQ layer removal · approximately 850 nm5010 · Main text · Figure 2; Figure S3 referenced
pressed pellet of powder Cu-TCNQresearch_0654__mat__mat_cu_tcnqPellet · Pristine Control · Pristine FrameworkPressed pellet used for direct-pin and EGaIn contact controls5013 · Main text · Figure 6a,b,c
Cu-TCNQ thin film on SAM/Auresearch_0654__mat__mat_cu_tcnqThin Film · Pristine Control · Pristine FrameworkPreformed Cu-TCNQ film grown by LbL; used as sacrificial layer and control thin filmcarboxy-terminated MUDA SAM on Au-coated silicon substrate · approximately 550 nmS2 · Experimental Section