cMOF Evidence Base

Synthesis evidence

In-situ growth of high-crystallinity M3(hexaaminotriphenylene)2 (M = Co, Ni) thin film for field-effect transistor-based glucose biosensor

Tan P., Shen S., Luo Y. et al. · Chinese Chemical Letters · 2026 · 111636

6 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Vague recipeSource: SI

Route 1: Unknown

Supporting information captions · Fig. S3

Metal precursorsCo salt, exact precursor/amount not reported for this control
Linker precursorsHITP
SolventsDMF or water, depending on control
Additivesnot specified
Atmospherenot specified
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCo saltNot specifiedSupporting information captions · Fig. S3
LinkerHITPNot specifiedSupporting information captions · Fig. S3
Complete recipeSource: Both

Route 2: Liquid Liquid Interface

In-situ synthesis of MOF Membrane

Metal precursorsCo(NO3)2.6H2O and NiCl2.6H2O
Linker precursors2,3,6,7,10,11-hexaaminotriphenylene.6HCl (HITP)
Solvents5.0 mL DMF for metal salts; 5.0 mL deionized water for HITP
Additives0.3 mL ammonia water
Atmospheresealed beaker; atmosphere not otherwise specified
Temperature65
Time1
Substrate orientationplasma-cleaned electrode substrate placed upside down and suspended on solution surface
Work-upsubstrate taken out and rinsed with DI water
Activationvacuum dried at 100 deg C for 2 h
Scalability contextIn-situ one-step water-bath heating on device substrate; presented as a versatile thin-film approach.
Show 6 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCo(NO3)2.6H2O5.5 mgIn-situ synthesis of MOF Membrane
Metal SourceNiCl2.6H2O2.2 mgIn-situ synthesis of MOF Membrane
Linker2,3,6,7,10,11-Hexaaminotriphenylene.6HCl (HITP)10.0 mgIn-situ synthesis of MOF Membrane
SolventN,N-dimethylformamide (DMF)5.0 mLIn-situ synthesis of MOF Membrane
Solventdeionized water5.0 mLIn-situ synthesis of MOF Membrane
Baseammonia water0.3 mLIn-situ synthesis of MOF Membrane
Complete recipeSource: SI

Route 3: Other

Sensor fabrication

Solvents1x PBS
Additivesglutaraldehyde and glucose oxidase
Atmosphereroom atmosphere; GOX incubation at 0-4 deg C
Temperatureroom temperature for GA; 0-4 for GOX incubation
Time1 h GA; 12 h GOX
Substrate orientationliquid cell over Co/Ni-HITP channel region
Work-upwashed three times with 1x PBS after GA; rinsed with PBS after GOX
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Additiveglutaraldehyde (GA)20 uL · 0.25 %Sensor fabrication
Additiveglucose oxidase (GOX)1.0 mg/mL in 1x PBSSensor fabrication
Solvent1x PBSpH 7.4Sensor fabrication
Vague recipeSource: Main

Route 4: Hydrothermal

2 · Results · Fig. 1d

Metal precursorsCo and Ni salts, exact amounts not reported for this control
Linker precursorsHITP
Solventswater
Additivesnot specified
Atmospherenot specified
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCo/Ni metal saltsNot specified2 · Results · Fig. 1d
LinkerHITPNot specified2 · Results · Fig. 1d
SolventwaterNot specified2 · Results · Fig. 1d
Complete recipeSource: SI

Route 5: Other

Fabrication of interdigital electrodes · Figs. S1-S2

Metal precursorsAu sputtered as electrode
Solventsdeionized water, absolute ethanol, acetone
AdditivesAZ5214E reversal resist; KMPPD-238 developer
Atmospherevacuum drying after lift-off
Temperature100 for prebake; 115 for reverse bake; 100 for vacuum drying
Time0.033 h prebake; 0.033 h reverse bake; 0.0083 h acetone lift-off; 2 h vacuum drying
Substrate orientationSiO2/Si wafer, p type, 285 +/- 10 nm oxide; later used as interdigital electrode substrate
Work-upultrasonic cleaning in acetone for 30 s, rinsed with DI water
Activationvacuum dried at 100 deg C for 2 h
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
OtherSiO2/Si wafers (p type, 285+/-10 nm)Not specifiedFabrication of interdigital electrodes · Figs. S1-S2
OtherAZ5214E reversal resistNot specifiedFabrication of interdigital electrodes · Figs. S1-S2
OtherKMPPD-238 developerNot specifiedFabrication of interdigital electrodes · Figs. S1-S2
OtherAu electrode38 mA sputtering current for 100 sFabrication of interdigital electrodes · Figs. S1-S2
SolventacetoneNot specifiedFabrication of interdigital electrodes · Figs. S1-S2
Vague recipeSource: Main

Route 6: Hydrothermal

2 · Results · Fig. 1d

Metal precursorsNi salt, exact amount not reported for this control
Linker precursorsHITP
Solventswater
Additivesnot specified
Atmospherenot specified
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceNi saltNot specified2 · Results · Fig. 1d
LinkerHITPNot specified2 · Results · Fig. 1d
SolventwaterNot specified2 · Results · Fig. 1d