Sensing Application — Electrochemical Synthesis of Cu3(HHTP)2Metal–Organic Frameworks from Cu Nanoparticles for Chemiresistive Gas Sensing

4 measurement groups · 12 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Electrochemically synthesised Cu3(HHTP)2 on Pt/glass IDE (2 h growth) · Electrode

Room temperature, 1 V bias, 500 sccm dry N2 carrier; NH3 1-5 ppm, 60 s exposures; Keysight U8001A supply + B2900A source meter

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Literature comparison NH3 LOD (Yao et al., spray LbL Cu3(HHTP)2)	approximately 500 ppb	—	—	Text Approximate	6 · 3.3 Chemiresistive Gas Sensing
NH3 limit of detection (theoretical, electrochemical MOF)Marked as a best value within this paper	158 +/- 6 ppb	—	+/- 6 ppb	Calculated From Reported Exact Reported	6 · 3.3 Chemiresistive Gas Sensing · Figure 6
NH3 recovery time (baseline recovery)	within 30 min of exposure ending	—	—	Text Approximate	6 · 3.3 Chemiresistive Gas Sensing · Figure 6a
NH3 response onset time	within 3 s of analyte exposure	—	—	Text Approximate	6 · 3.3 Chemiresistive Gas Sensing · Figure 6a
NH3 sensitivity (slope of response vs concentration)Marked as a best value within this paper	0.154 +/- 0.006 % ppm-1	—	+/- 0.006 % ppm-1	Text Exact Reported	6 · 3.3 Chemiresistive Gas Sensing · Figure 6b
As-made sensor response to 3 ppm NH3	0.41 %	—	—	Text Exact Reported	6 · 3.3 Chemiresistive Gas Sensing
Sensor baseline resistance (2 h electrochemical sample, as-made)	183 Ohm	—	—	Text Exact Reported	6 · 3.3 Chemiresistive Gas Sensing

Solution-synthesised Cu3(HHTP)2 drop-cast on IDE (comparison/control) · Electrode

Same sensing conditions (1 V, dry N2, NH3 1-5 ppm, 60 s); initial device resistance 4450 Ohm

Temperature: 298
Atmosphere: dry N2 carrier gas
Geometry: drop-cast MOF-on-IDE chemiresistor
Context: pristine control
Measurement source: 5 · SI 4. Solution-synthesized MOF NH3 Sensing · Figure S4

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
NH3 limit of detection, solution-synthesised drop-cast control	1200 +/- 200 ppb	—	+/- 200 ppb	Text Exact Reported	7 · 3.3 Chemiresistive Gas Sensing · Figure S4
Solution-synthesised drop-cast sensor initial resistance	4450 Ohm	—	—	Text Exact Reported	5 · SI 4. Solution-synthesized MOF NH3 Sensing · Figure S4

Electrochemically synthesised Cu3(HHTP)2 sensor after 1 year ambient storage · Electrode

Same sensor re-tested 12 months later; 3 ppm NH3, four repeat exposures

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Sensor baseline resistance after 1 year ambient storage	1245 Ohm (from 183 Ohm)	—	—	Text Exact Reported	4 · SI 3. Long-term stability · Figure S3
Aged sensor response to 3 ppm NH3 (first exposure)	12 %	—	—	Text Rounded Reported	4 · SI 3. Long-term stability · Figure S3

Electrochemically synthesised Cu3(HHTP)2 on Pt/glass IDE (2 h growth) · Electrode

Same setup as NH3; NO2 1-5 ppm, 60 s exposures; room temperature, dry N2 carrier

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
NO2 sensing response (qualitative)	irreversible resistance decrease (p-type behaviour)	—	—	Qualitative Qualitative	3 · SI 2. Sensing Response to NO2 · Figure S2