Microscopy Morphology — Porous field-effect transistors based on a semiconductive metal-organic framework

2 measurement groups · 8 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Cross-sectional SEM and optical microscopy

Scanning electron microscopy

Ni3(HITP)2-based porous FET device 1 · Electrode

Device geometry checked by cross-sectional SEM and top-view optical microscopy.

Geometry: Bottom-gate top-contact FET, 105 nm Ni3(HITP)2 channel, 300 nm SiO2 dielectric, 50 nm Au contacts, W/L = 1000/100 um.
Context: pristine Ni3(HITP)2 channel in device stack
Measurement source: main p.2 / article p.1361 · Results and discussion · Figure S8

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
FET active channel membrane thickness	105 nm	—	—	Text Exact Reported	main p.2 / article p.1361 · Results and discussion · Figure S8
Au source/drain electrode thickness	50 nm	—	—	Text Exact Reported	main p.2 / article p.1361 · Results and discussion · Figure S8
FET channel length	100 um	—	—	Text Exact Reported	main p.2 / article p.1361 · Results and discussion · Figure S8
FET channel width	1000 um	—	—	Text Exact Reported	main p.2 / article p.1361 · Results and discussion · Figure S8

SEM and AFM

Scanning electron microscopy Atomic force microscopy

Free-standing Ni3(HITP)2 membrane · Thin Film

SEM used to evaluate top and bottom membrane surfaces after transfer onto silicon wafer; AFM measured top-surface roughness over 3 um x 3 um and 20 um x 20 um areas.

Context: pristine Ni3(HITP)2 membrane
Measurement source: main p.2 / article p.1361 · Results and discussion · Figure 1c,d; Figures S4,S5

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Membrane thickness after 3 min reaction	approximately 100 nm	—	—	Text Approximate	main p.2 / article p.1361 · Results and discussion
Top-surface morphology	ultraflat, compact, uniform on a large scale, without steps or cracks	—	—	Text Qualitative	main p.2 / article p.1361 · Results and discussion · Figure 1c; Figure S4
Average RMS roughness over nine selected 20 um x 20 um areas	approximately 1.43 nm	—	—	Text Approximate	main p.2 / article p.1361 · Results and discussion · Figure S5
Top-surface RMS roughness over 3 um x 3 um	approximately 1.05 nm over an area of 3 um x 3 um	—	—	Text Approximate	main p.2 / article p.1361 · Results and discussion · Figure 1d