Electrical Transport — Metal-Organic Framework Assembled on Oriented Nanofiber Arrays for Field-Effect Transistor and Gas Sensor-Based Applications

Measurement evidence

Electrical Transport

Metal-Organic Framework Assembled on Oriented Nanofiber Arrays for Field-Effect Transistor and Gas Sensor-Based Applications · Mu J., Zhong X., Dai W. et al. · Molecules · 2022 · 2131

5 measurement groups · 12 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

flat-capacitor capacitance and permittivity measurement

Al/PMMA:PDMS-PCDA/Cu/Al flat capacitor dielectric film · Thin Film

Al/PMMA:PDMS-PCDA/Cu/Al capacitor; capacitance and permittivity selected at 30 kHz for FET mobility calculation.

Temperature
296.65
Geometry
Al/PMMA:PDMS-PCDA/Cu/Al flat capacitor
Context
Composite dielectric layer supporting Cu3(HITP)2 NFA FETs.
Measurement source
S2 and S8 · Section S1. Materials and Methods · Figure S5
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Cgate used for FET mobility calculation11.2 nF/cm2 at 30 kHzText
Exact Reported
S2 · Field Effect Transistors measurements · Figure S5
relative permittivity near 30 kHzapproximately 5.4 at 30 kHzvisual estimate from Figure S5aFigure Axis
Approximate
S8 · Section S3. Characterization · Figure S5a

field-effect transistor transfer measurement

Cu3(HITP)2 NFAs on PDMS-PCDA/Cu, 300 r/min · Electrode

Top-contact Cu3(HITP)2 NFA FET; Vg swept from -10 V to 10 V; Vds = 0.8 V shown in Figure 5d.

Geometry
Au top-contact electrode arrays on highly phosphorus-doped (n++) Si substrate.
Context
Composite NFA active layer.
Measurement source
9-10 · 3.1 Field-Effect Transistor Measurements · Figure 5d; Table 1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
hole mobility at 300 r/min4.23 cm2/(V s)Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
Ion/Ioff at 300 r/min4.8 x 10^3Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
threshold voltage at 300 r/min3.4 VTable
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1

field-effect transistor transfer measurement

Cu3(HITP)2 NFAs on PDMS-PCDA/Cu, 400 r/min · Electrode

Top-contact Cu3(HITP)2 NFA FET; Vg swept from -10 V to 10 V; Vds = 0.8 V shown in Figure 5c.

Geometry
Au top-contact electrode arrays on highly phosphorus-doped (n++) Si substrate.
Context
Composite NFA active layer.
Measurement source
9-10 · 3.1 Field-Effect Transistor Measurements · Figure 5c; Table 1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
hole mobility at 400 r/min4.41 cm2/(V s)Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
Ion/Ioff at 400 r/min7.9 x 10^3Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
threshold voltage at 400 r/min3.05 VTable
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1

field-effect transistor transfer measurement

Cu3(HITP)2 NFAs on PDMS-PCDA/Cu, 500 r/min · Electrode

Top-contact Cu3(HITP)2 NFA FET; Vg swept from -10 V to 10 V; Vds = 0.8 V shown in Figure 5b.

Geometry
Au top-contact electrode arrays on highly phosphorus-doped (n++) Si substrate.
Context
Composite NFA active layer.
Measurement source
9-10 · 3.1 Field-Effect Transistor Measurements · Figure 5b; Table 1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
hole mobility at 500 r/minMarked as a best value within this paper5.09 cm2/(V s)Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
Ion/Ioff at 500 r/minMarked as a best value within this paper9.6 x 10^3Table
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1
threshold voltage at 500 r/minMarked as a best value within this paper2.9 VTable
Exact Reported
10 · 3.1 Field-Effect Transistor Measurements · Table 1

Hall-effect V-I measurement

Cu3(HITP)2 NFAs on PDMS-PCDA/Cu, 500 r/min · Electrode

V-I curves measured for Cu3(HITP)2 NFAs (500 r/min) along electrode pairs A-B, C-D, B-C and D-A; IS = 0.05 mA in Figure S6.

Geometry
Cu3(HITP)2 NFAs on (n++) Si substrate.
Context
Composite NFA active layer.
Measurement source
S9 · Section S3. Characterization · Figure S6
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
directional V-I behaviourlinear V-I curve along Cu3(HITP)2 NFA direction; nonlinear perpendicular to NFAsText
Qualitative
10 · 3.1 Field-Effect Transistor Measurements · Figure S6 referenced