XPS of Cu 2p plus PXRD of H2O2-doped 1ADCu
H2O2-doped 1ADCu powder samples · Powder
XPS with Al Kalpha source in 1e-5 torr vacuum; PXRD with Cu Kalpha source at room temperature.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| H2O2 doping partially oxidises Cu in 1ADCu | Cu partially oxidised from +1 to +2 | — | — | Text Qualitative | main p.6, article p.354 · Doping and transport · Fig. S9a |
| 1ADCu structure changes at 100000 ppm H2O2 | 10^5 ppm H2O2 leads to structural change | — | — | Caption Exact Reported | SI p.14 · Supplementary figures · Fig. S9b |
| 1ADCu structure retained under H2O2 doping up to 10000 ppm | Pristine and 10 to 10^4 ppm H2O2-doped samples have same diffraction pattern | — | — | Caption Exact Reported | SI p.14 · Supplementary figures · Fig. S9b |
| Pristine 1ADCu Cu oxidation state | Cu is in +1 state in undoped MOCs | — | — | Caption Qualitative | SI p.14 · Supplementary figures · Fig. S9 |