| MASS-PRC Co3(HITP)2 thin filmresearch_0124__mat__mat_co3hitp2 | Thin Film · Target Sample · Pristine Framework | Microfluidic-assisted solution shearing of Co(NO3)2/HATP streams followed by TEA treatment.heated substrate, not further specified | 24 · Figure S10 · Figure S10 |
| X-shaped microfluidic mixer CFD modelresearch_0124__mat__mat_micromixer_model | Model · Model System · Model | COMSOL Multiphysics finite-element model using DMF solvent properties and Ni2+/HITP3- inlet concentrations. | 5 · Mathematical details about numerical simulation (CFD) · Table S2 |
| Ni3(HITP)2 thin-film chemiresistive sensor on aluminaresearch_0124__mat__mat_ni3hitp2 | Electrode · Target Sample · Pristine Framework | MASS-PRC Ni3(HITP)2 film prepared on patterned alumina electrode for gas sensing.2.5 mm x 2.5 mm x 0.2 mm alumina substrate with interdigitated gold electrode, 150 um gap · not separately specified for alumina devices | 8 · Chemiresistive gas sensing measurement |
| Bulk Ni3(HITP)2 powder drop-cast sensor controlresearch_0124__mat__mat_ni3hitp2 | Powder · Pristine Control · Pristine Framework | Ni3(HITP)2 powder dispersed in ethanol, drop-coated three times, and dried at 60 deg C.interdigitated gold electrode sensor substrate · thick randomly oriented powder coating; crystallite size about 100-300 nm | 5 · 2.3 Sensing Characterizations · Figure 4a |
| Flexible Ni3(HITP)2 thin-film sensorresearch_0124__mat__mat_ni3hitp2 | Electrode · Target Sample · Pristine Framework | MASS-PRC Ni3(HITP)2 film on flexible PI/PET electrode for bending and humid H2S tests.polyimide or polyethylene terephthalate film with interdigitated gold electrode, 360 um gap · flexible substrate thickness 125 um; MOF film thickness not separately specified | 9 · Chemiresistive gas sensing measurement · Figure 5 |
| MASS-PRC Ni3(HITP)2 thin filmresearch_0124__mat__mat_ni3hitp2 | Thin Film · Target Sample · Pristine Framework | Microfluidic-assisted solution shearing followed by TEA post-synthetic rapid crystallisation.Si wafer, glass, quartz, PI, PET, alumina sensor substrate depending on test · 11-64 nm, controlled by shearing speed | 5 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 3 |
| Ni3(HITP)2@Pt thin filmresearch_0124__mat__mat_ni3hitp2_pt | Thin Film · Target Sample · Doped | MASS-PRC route with PtCl2 included in the metal-source stream.not specified | 35 · Figure S21 · Figure S21 |
| Pre-treatment Ni/HATP amorphous thin-film precursorresearch_0124__mat__mat_ni3hitp2 | Thin Film · Paper Level Unspecified · Unknown | Mixed NiCl2/HATP film before heated TEA deprotonation/crystallisation treatment.film substrate not separately specified for spectroscopy | 4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2 |
| Ni-HHTP after H2S exposureresearch_0124__mat__mat_nihhtp | Unknown · Model System · Pristine Framework | Ni-HHTP control exposed to H2S for EPR and S 2p XPS mechanism comparison. | 40 · Figure S26 Discussion · Figure S26 |