Spectroscopy — Large-Area Synthesis of Ultrathin, Flexible, and Transparent Conductive Metal–Organic Framework Thin Films via a Microfluidic-Based Solution Shearing Process

Measurement evidence

Spectroscopy

Large-Area Synthesis of Ultrathin, Flexible, and Transparent Conductive Metal–Organic Framework Thin Films via a Microfluidic-Based Solution Shearing Process · Lee T., Kim J.-O., Park C. et al. · Advanced Materials · 2022 · 2107696

2 measurement groups · 10 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

FTIR, XPS and Raman before/after TEA treatment

MASS-PRC Ni3(HITP)2 thin film · Thin Film

Chemical bonding comparison of precursor film and post-treated Ni3(HITP)2 film.

Context
pre-treatment precursor compared with pristine Ni3(HITP)2 thin film
Measurement source
4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2; Figures S8-S9
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
FTIR N-H stretch decrease range3550-3250 cm-1 N-H stretches decrease after deprotonationText
Range
4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2c
Raman ID/IG after treatment1.04Text
Exact Reported
23 · Figure S9 Discussion · Figure S9
Raman ID/IG before treatment1.18Text
Exact Reported
23 · Figure S9 Discussion · Figure S9
Before-treatment Cl 2p peaks199.3 and 197.7 eVText
Exact Reported
4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2e
After-treatment Ni-N4 N 1s peak398.9 eVText
Exact Reported
4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2f

Ex situ S 2p XPS, N 1s XPS, Ni 2p XPS and EPR after H2S exposure

MASS-PRC Ni3(HITP)2 thin film · Thin Film

Thin film and bulk powder exposed to H2S and analysed for adsorbate and linker redox evidence.

Temperature
room temperature
Atmosphere
H2S exposure
Context
pristine Ni3(HITP)2 film and powder; Ni-HHTP analogue control
Measurement source
6 · 2.3 Sensing Characterizations · Figure 4c,d; Figures S24-S26
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
HITP-centred radical EPR g value after H2S exposureg = 1.99Text
Exact Reported
39 · Figure S25 Discussion · Figure S25
Ni3(HITP)2 sulfite:sulfide S 2p ratiosulfite : sulfide = 1 : 3.57Text
Exact Reported
40 · Figure S26 Discussion · Figure S26
Ni-HHTP sulfite:sulfide S 2p ratiosulfite : sulfide = 1 : 0.75Text
Exact Reported
40 · Figure S26 Discussion · Figure S26
Sulfide S 2p3/2 binding energy after H2S exposure163.8 eVText
Exact Reported
6 · 2.3 Sensing Characterizations · Figure 4c,d
Sulfite S 2p3/2 binding energy after H2S exposure167.7 eVText
Exact Reported
6 · 2.3 Sensing Characterizations · Figure 4c,d