FTIR, XPS and Raman before/after TEA treatment
MASS-PRC Ni3(HITP)2 thin film · Thin Film
Chemical bonding comparison of precursor film and post-treated Ni3(HITP)2 film.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| FTIR N-H stretch decrease range | 3550-3250 cm-1 N-H stretches decrease after deprotonation | — | — | Text Range | 4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2c |
| Raman ID/IG after treatment | 1.04 | — | — | Text Exact Reported | 23 · Figure S9 Discussion · Figure S9 |
| Raman ID/IG before treatment | 1.18 | — | — | Text Exact Reported | 23 · Figure S9 Discussion · Figure S9 |
| Before-treatment Cl 2p peaks | 199.3 and 197.7 eV | — | — | Text Exact Reported | 4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2e |
| After-treatment Ni-N4 N 1s peak | 398.9 eV | — | — | Text Exact Reported | 4 · 2.2 Characterizations of Ni3(HITP)2 Thin Film · Figure 2f |