cMOF Evidence Base

Synthesis evidence

High-Performance Ni3(HHTP)2 Film-Based Flexible Field-Effect Transistor Gas Sensors

Lu G., Zong B., Tao T. et al. · ACS Sensors · 2024 · 1916-1926

2 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Both

Route 1: Other

p003 · Experimental Section

Metal precursors(CH3COO)2Ni.4H2O in aqueous precursor solution; amount assumed same as PI procedure but not restated for each substrate
Linker precursorsHexahydroxytriphenylene in aqueous precursor solution; amount assumed same as PI procedure but not restated for each substrate
SolventsDeionized water; cleaning/washing solvents as in PI route unless modified in SI
AdditivesAmmonia to pH 7.5-8.0 in the precursor preparation
AtmosphereNot specified for each non-PI substrate
Temperature90
Time3
Substrate orientationOther flexible substrates fabricated with a similar procedure; exact orientation not separately specified.
Work-upSimilar to PI route; detailed substrate-specific workup not given in main text.
ActivationNo separate activation reported.
Scalability contextDemonstrated across tape (PET), facemask, paper cup, tablecloth, and take-out bag (textile); substrate-specific variations are not enumerated beyond "similar procedure".
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
Metal Source(CH3COO)2Ni.4H2O30 mg in PI route; not restated per other substrate · in 4 mL deionized water in PI routep003 · Experimental Section
Linkerhexahydroxytriphenylene17.5 mg in PI route; not restated per other substrate · in 4 mL deionized water in PI routep003 · Experimental Section
Baseammoniato pH 7.5-8.0p003 · Experimental Section
Otherflexible substrates: tape (PET), facemask, paper cup, tablecloth, take-out bag (textile)Not specifiedp003 · Experimental Section
Complete recipeSource: Both

Route 2: Other

p003 · Experimental Section · Figure 1; SI Figure S1

Metal precursors(CH3COO)2Ni.4H2O, 30 mg in 4 mL deionized water
Linker precursorsHexahydroxytriphenylene, 17.5 mg in 4 mL deionized water
SolventsDeionized water for precursor solutions; acetone, isopropanol, deionized water for substrate cleaning; ethanol and deionized water for washing
AdditivesAmmonia to adjust nickel solution to pH 7.5-8.0
AtmosphereRoom-temperature precursor mixing in ambient atmosphere not otherwise specified; substrate blow-dried in argon gas; growth atmosphere at 90 C not specified.
Temperature90
Time3
Substrate orientationPI substrate with Au electrodes suspended face down on the precursor-solution surface
Work-upAfter 90 C standing, substrate washed with ethanol and deionized water to remove excess impurities and dried naturally at room temperature.
ActivationNo separate activation reported for the film sensor in the main text.
Scalability contextMain text describes a 10 x 5 mm2 PI device and notes the same in situ growth procedure was applied to five other flexible substrates. SI was checked and adds device/setup figures, but no additional synthetic reagent quantities.
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal Source(CH3COO)2Ni.4H2O30 mg · in 4 mL deionized waterp003 · Experimental Section · Figure 1; SI Figure S1
Linkerhexahydroxytriphenylene17.5 mg · in 4 mL deionized waterp003 · Experimental Section · Figure 1; SI Figure S1
Baseammoniato pH 7.5-8.0p003 · Experimental Section · Figure 1; SI Figure S1
Solventdeionized water4 mL + 4 mLp003 · Experimental Section · Figure 1; SI Figure S1
OtherPI substrate with Au electrodes10 x 5 mm2 substrate; 6 mm channel length; 100 um finger gap; 100 nm Au thicknessp003 · Experimental Section · Figure 1; SI Figure S1