Microscopy Morphology — Orientation Control of a Two-Dimensional Conductive Metal-Organic Framework Thin Film by a Pyridine Vapor-Assisted Dry Process

3 measurement groups · 4 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

(001)-oriented Cu3(HHTP)2 thin film annealed with 3 uL pyridine · Thin Film

SI comparison of as-deposited and pyridine-vapour annealed film surfaces.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
annealed film flake-like morphology	annealed film shows flake-like morphology with enlarged particle size in the in-plane direction	—	—	Caption Qualitative	p002 · Figure caption · Figure S2

(001)-oriented Cu3(HHTP)2 thin film annealed with 3 uL pyridine · Thin Film

Surface morphology and Al/Cu/C elemental maps of pyridine-vapour annealed Cu3(HHTP)2 film.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
in-plane Cu and C elemental uniformity	Cu and C uniformly distributed over scanned area; good film coverage	—	—	Qualitative Qualitative	p004 · Results and Discussion · Figure 3a-d

(001)-oriented Cu3(HHTP)2 thin film annealed with 3 uL pyridine · Thin Film

Depth profile of C-, Cu-, Al- and Si-related signals through the annealed Cu3(HHTP)2 film and alpha-Al2O3 substrate.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
SIMS film/substrate interface sputtering time	approximately 170 s	—	—	Text Approximate	p004 · Results and Discussion · Figure 3e
Si absorber residue in film	Si signal negligible; Si not contained in the thin film	—	—	Qualitative Qualitative	p004 · Results and Discussion · Figure 3e