Spectroscopy — High performance metal–organic-framework coatings obtained via thermal gradient synthesis

3 measurement groups · 11 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

ATR FT-IR spectroscopy

Infrared spectroscopy

Separated thin bottom layer · Thin Film

Bruker Alpha FT spectrometer with ATR unit; 32 scans per spectrum; compared H3btc, separated bottom layer, separated top layer and whole coating after purification.

Atmosphere: not specified
Geometry: separated layers and whole coating
Context: bottom layer versus top layer/whole coating
Measurement source: 9709 · Results · Figure 4

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
additional bottom-layer FTIR band	1015 cm^-1	—	—	Text Exact Reported	9709 · Results · Figure 4
additional bottom-layer FTIR band	1258 cm^-1	—	—	Text Exact Reported	9709 · Results · Figure 4
additional bottom-layer FTIR band	800 cm^-1	—	—	Text Exact Reported	9709 · Results · Figure 4

XPS survey after 100 nm Ar+ sputtering

X-ray photoelectron spectroscopy

Separated thin bottom layer · Thin Film

Same XPS method as 50 nm sputter measurement; bottom layer after removing 100 nm by sputtering.

Atmosphere: vacuum XPS
Geometry: bottom layer after removing 100 nm by sputtering
Context: bottom interlayer component
Measurement source: 4 · XPS · Figure S4b

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
C 1s atomic fraction after 100 nm sputterMarked as a best value within this paper	90.605 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4b
Cu 2p atomic fraction after 100 nm sputter	3.020 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4b
N 1s atomic fraction after 100 nm sputter	3.118 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4b
O 1s atomic fraction after 100 nm sputter	3.257 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4b

XPS survey after 50 nm Ar+ sputtering

X-ray photoelectron spectroscopy

Separated thin bottom layer · Thin Film

VG Scientific LTD XPS, monochromatised Al Kalpha 1486.6 eV; pass energy 15 eV; sputtered with Ar+ at 3.5 kV and 4 mA to expose bottom layer.

Atmosphere: vacuum XPS
Geometry: bottom layer after removing 50 nm by sputtering
Context: bottom interlayer component
Measurement source: 4 · XPS · Figure S4a

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
C 1s atomic fraction after 50 nm sputterMarked as a best value within this paper	77.895 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4a
Cu 2p atomic fraction after 50 nm sputter	7.851 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4a
N 1s atomic fraction after 50 nm sputter	4.099 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4a
O 1s atomic fraction after 50 nm sputter	10.154 at%	—	—	Visual Estimate Rounded Reported	4 · XPS · Figure S4a