FESEM, TEM, HRTEM, electron diffraction and AFM
Electron diffractionScanning electron microscopyTransmission electron microscopyAtomic force microscopy
NMOF-1 bulk nanosheets/powder · Nanosheet
FESEM on silicon wafer; TEM after ethanol sonication/drop-casting on carbon-coated Cu grid; AFM height profiles
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| AFM nanosheet height upper bound | 40-70 nm | — | — | Text Range | 2 · Results and Discussion · Figure S9 |
| AFM nanosheet height lower bound | 40-70 nm | — | — | Text Range | 2 · Results and Discussion · Figure S9 |
| nanosheet length upper bound | 300-600 nm | — | — | Text Range | 2 · Results and Discussion · Figures 1c and S7 |
| nanosheet length lower bound | 300-600 nm | — | — | Text Range | 2 · Results and Discussion · Figures 1c and S7 |
| nanosheet width upper bound | 300-500 nm | — | — | Text Range | 2 · Results and Discussion · Figures 1c and S7 |
| nanosheet width lower bound | 300-500 nm | — | — | Text Range | 2 · Results and Discussion · Figures 1c and S7 |
| HRTEM ordered-line spacing upper bound | 1-1.5 nm | — | — | Text Range | 2 · Results and Discussion · Figure 1f |
| HRTEM ordered-line spacing lower bound | 1-1.5 nm | — | — | Text Range | 2 · Results and Discussion · Figure 1f |
| estimated pi-stacked chain count upper bound | 90-160 pi-stacked OPE-C12 1D chains | — | — | Text Range | 2 · Results and Discussion · Figure S9 |
| estimated pi-stacked chain count lower bound | 90-160 pi-stacked OPE-C12 1D chains | — | — | Text Range | 2 · Results and Discussion · Figure S9 |