Thermoelectric — Charge. transport, conductivity and Seebeck coefficient in pristine and TCNQ loaded preferentially grown metal-organic framework films

4 measurement groups · 6 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Preferentially (001)-oriented pristine HKUST-1 SURMOF film, 100 nm · Thin Film

Horizontal Seebeck coefficient of 100 nm highly oriented HKUST-1 film over approximately 295-350 K.

Temperature: 295-350
Geometry: lateral in-plane measurement parallel to film surface
Context: pristine oriented control
Measurement source: article pages 5-6 · 1.1 Seebeck coefficient · Figure 6(a)

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Horizontal Seebeck coefficient of oriented pristine film	around 0 uV K-1 from 295 K to 350 K	0 uV K^-1	within noise level	Text Approximate	article page 5 · 1.1 Seebeck coefficient · Figure 6(a)

Preferentially (001)-oriented TCNQ-loaded HKUST-1 SURMOF film, 100 nm · Thin Film

Horizontal Seebeck coefficient of 100 nm highly oriented TCNQ-loaded HKUST-1 film over approximately 295-350 K.

Temperature: 295-350
Geometry: lateral in-plane measurement parallel to film surface
Context: guest-loaded oriented sample compared with pristine control
Measurement source: article pages 5-6 · 1.1 Seebeck coefficient · Figure 6(a)

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Horizontal Seebeck coefficient of oriented TCNQ-loaded film	around 0 uV K-1 from 295 K to 350 K	0 uV K^-1	within noise level	Text Approximate	article page 5 · 1.1 Seebeck coefficient · Figure 6(a)

Random polycrystalline pristine HKUST-1 SURMOF film on thermally oxidized Si, 200 nm · Thin Film

Horizontal Seebeck coefficient of random polycrystalline HKUST-1 film on thermally oxidized Si from 290-330 K, compared with TCNQ-loaded film.

Temperature: 290-330
Geometry: lateral in-plane measurement
Context: pristine random polycrystalline control
Measurement source: article pages 5-6 · 1.1 Seebeck coefficient · Figure 6(b)

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Pristine random polycrystalline Seebeck coefficient at 330 K	approximately 430 uV K-1 at 330 K from Figure 6(b)	430 uV K^-1	visual estimate, about +/-20 uV K-1	Figure Axis Approximate	article page 6 · Figure 6 · Figure 6(b)
Pristine polycrystalline Seebeck offset above TCNQ-loaded film	parallel shifted by approximately 50 uV K-1 over 290-330 K	50 uV K^-1	—	Text Approximate	article page 5 · 1.1 Seebeck coefficient · Figure 6(b)

Random polycrystalline TCNQ-loaded HKUST-1 SURMOF film on thermally oxidized Si, 200 nm · Thin Film

Horizontal Seebeck coefficient of 200 nm TCNQ-loaded random polycrystalline HKUST-1 film from 290-350 K.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
TCNQ-loaded random polycrystalline Seebeck coefficient at 290 K	342.39 uV K-1 at 290 K	342.39 uV K^-1	—	Text Exact Reported	article page 5 · 1.1 Seebeck coefficient · Figure 6(b)
TCNQ-loaded random polycrystalline Seebeck coefficient at 350 KMarked as a best value within this paper	422.32 uV K-1 at 350 K	422.32 uV K^-1	—	Text Exact Reported	article page 5 · 1.1 Seebeck coefficient · Figure 6(b)