| S1-based Ni3(HITP)2-GA-DNA FET sensorresearch_0491__mat__mat_ni3_hitp2_ga_dna | Electrode · Target Sample · Composite | S1 membrane modified with 0.25% GA for 60 min and 10 uM DNA probe in 1x TE buffer for 12 h at 0-4 deg C.S1 Ni3(HITP)2 membrane on Si/SiO2/Au FET device with silicon rubber liquid cell · pristine membrane thickness 24.1 nm before modification | 623 · 2.4. Sensor Fabrication |
| S1 Ni3(HITP)2 membraneresearch_0491__mat__mat_ni3_hitp2 | Thin Film · Pristine Control · Pristine Framework | In situ hydrothermal membrane grown with ammonia/water volume ratio 1/5; pH 9.9; dried under vacuum at 100 deg C for 2 h.Si/SiO2 FET device with patterned Au source/drain electrodes · 24.1 nm | 623 · 2.3. In Situ Synthesis of Ni3(HITP)2 Membranes |
| S2-based Ni3(HITP)2-GA-DNA FET sensorresearch_0491__mat__mat_ni3_hitp2_ga_dna | Electrode · Target Sample · Composite | S2 membrane modified with 0.25% GA for 60 min and 10 uM DNA probe in 1x TE buffer for 12 h at 0-4 deg C.S2 Ni3(HITP)2 membrane on Si/SiO2/Au FET device with silicon rubber liquid cell · pristine membrane thickness 60.5 nm before modification | 626 · 3.2. Hg2+ Sensing Performance · Figure 6b |
| S2 Ni3(HITP)2 membraneresearch_0491__mat__mat_ni3_hitp2 | Thin Film · Pristine Control · Pristine Framework | In situ hydrothermal membrane grown with ammonia/water volume ratio 1/2; pH 10.2; dried under vacuum at 100 deg C for 2 h.Si/SiO2 FET device with patterned Au source/drain electrodes · 60.5 nm | 623 · 2.3. In Situ Synthesis of Ni3(HITP)2 Membranes |
| S3-based Ni3(HITP)2-GA-DNA FET sensorresearch_0491__mat__mat_ni3_hitp2_ga_dna | Electrode · Target Sample · Composite | S3 membrane modified with 0.25% GA for 60 min and 10 uM DNA probe in 1x TE buffer for 12 h at 0-4 deg C.S3 Ni3(HITP)2 membrane on Si/SiO2/Au FET device with silicon rubber liquid cell · pristine membrane thickness 88.3 nm before modification | 627 · 3.2. Hg2+ Sensing Performance · Figure 6c |
| S3 Ni3(HITP)2 membraneresearch_0491__mat__mat_ni3_hitp2 | Thin Film · Pristine Control · Pristine Framework | In situ hydrothermal membrane grown with ammonia/water volume ratio 2/1; pH 10.6; dried under vacuum at 100 deg C for 2 h.Si/SiO2 FET device with patterned Au source/drain electrodes · 88.3 nm | 623 · 2.3. In Situ Synthesis of Ni3(HITP)2 Membranes |
| S4-based Ni3(HITP)2-DNA FET sensor controlresearch_0491__mat__mat_ni3_hitp2_dna | Electrode · Pristine Control · Composite | S4 membrane exposed to DNA probe without GA cross-linking.S4 Ni3(HITP)2 membrane on Si/SiO2/Au FET device · pristine membrane thickness 114.7 nm before modification | 627 · 3.2. Hg2+ Sensing Performance · Figure S9 |
| S4-based Ni3(HITP)2-GA FET sensor controlresearch_0491__mat__mat_ni3_hitp2_ga | Electrode · Pristine Control · Composite | S4 membrane modified with GA but without DNA probe.S4 Ni3(HITP)2 membrane on Si/SiO2/Au FET device · pristine membrane thickness 114.7 nm before modification | 627 · 3.2. Hg2+ Sensing Performance · Figure S9 |
| S4-based Ni3(HITP)2-GA-DNA FET sensorresearch_0491__mat__mat_ni3_hitp2_ga_dna | Electrode · Target Sample · Composite | S4 membrane modified with 0.25% GA for 60 min and 10 uM DNA probe in 1x TE buffer for 12 h at 0-4 deg C.S4 Ni3(HITP)2 membrane on Si/SiO2/Au FET device with silicon rubber liquid cell · pristine membrane thickness 114.7 nm before modification | 627 · 3.2. Hg2+ Sensing Performance · Figures 6d and 7 |
| S4 Ni3(HITP)2 membraneresearch_0491__mat__mat_ni3_hitp2 | Thin Film · Pristine Control · Pristine Framework | In situ hydrothermal membrane grown with ammonia/water volume ratio 3/0; pH 11.1; dried under vacuum at 100 deg C for 2 h.Si/SiO2 FET device with patterned Au source/drain electrodes · 114.7 nm | 626 · 3.1. Structural and Morphological Characteristics · Figure 2d,h |
| S4-based unmodified Ni3(HITP)2 FET sensor controlresearch_0491__mat__mat_ni3_hitp2 | Electrode · Pristine Control · Pristine Framework | Unmodified S4 membrane tested directly for Hg2+ response.S4 Ni3(HITP)2 membrane on Si/SiO2/Au FET device · 114.7 nm | S-11 · Figure S9 caption · Figure S9a |