Complete recipeSource: Both
Route 1: Electrochemical
SI p.S-2 · 1-Hexyne loading and Electropolymerization · Figure S6
Metal precursors1-hexyne-loaded Cu(BDC) SURMOF-2 cathode
Solventsdichloromethane
Additives0.1 M tetrabutylammonium hexafluorophosphate (TBAHFP) supporting electrolyte
Atmosphereargon used during loading; electrochemical solution described as dichloromethane/TBAHFP
Temperatureroom temperature
Time0.25 h
Substrate orientationtwo-compartment cell; SURMOF substrate as cathode; Ag-strip anode, S about 3 cm2
Oxidant / reductantCathodic reduction/electroinitiated polymerisation under negative DC voltage
Work-upNo isolation required for in situ I-V; separate MALDI workup dissolved film in ethanolic acetic acid.
ActivationImmediate use after loading and dichloromethane rinse.
Scalability contextConstant-voltage two-electrode setup used to overcome low currents through the pristine SURMOF cathode.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Electrolyte | TBAHFP | 15 ml solution in both compartments · 0.1 M | SI p.S-2 · 1-Hexyne loading and Electropolymerization · Figure S6 |
| Solvent | dichloromethane | 15 ml | SI p.S-2 · 1-Hexyne loading and Electropolymerization · Figure S6 |
| Other | Ag-strip electrode | S about 3 cm2 | SI p.S-2 · 1-Hexyne loading and Electropolymerization · Figure S6 |