Metal precursors20 mg Fe(acac)3 powders, iron(III) acetylacetonate
Linker precursors2 mg HHB powders, hexahydroxybenzene
Solventsnone for CVD; substrates cleaned with acetone, ethanol and DI water
AdditivesNH3 vapour released from 0.14 mol/L NH3.H2O solution for optimal Fe-HHB-w growth
Atmosphere200 sccm N2 purge, pumped to low pressure about 0.5 mbar; NH3 vapour introduced
TemperatureHHB zone 200; Fe(acac)3 zone 105; ramp 5 min
Time0.167-6
Substrate orientationSiO2/Si or quartz substrates placed in the longer tube about 70 mm from HHB powder
Work-upCool down to room temperature before stopping the pump.
Scalability contextUniform films over about 1 cm2 substrate areas; compatible with device fabrication.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|
| Linker | HHB powders (HHB = hexahydroxybenzene, TCI Deutschland GmbH) | 2 mg | SI p2 · CVD growth of 2D c-CPs thin films · Figure S1 |
| Metal Source | Fe(acac)3 powders (iron(III) acetylacetonate, BLD Pharmatech GmbH) | 20 mg | SI p2 · CVD growth of 2D c-CPs thin films · Figure S1 |
| Base | NH3.H2O solution diluted from 25% ammonia solution | container with small syringe-needle opening · 0.14 mol/L for optimal Fe-HHB-w; broader range 1.4 mmol/L to 14 mol/L | SI p2 · CVD growth of 2D c-CPs thin films · Figure S1 |
| Other | N2 purge gas | 200 sccm | SI p2 · CVD growth of 2D c-CPs thin films · Figure S1 |