Synthesis evidence

Ammonia-Assisted Chemical Vapor Deposition Growth of Two-Dimensional Conjugated Coordination Polymer Thin Films

Liu J., Fu S., Fu Y. et al. · Journal of the American Chemical Society · 2025 · 18190-18196

11 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Vague recipeSource: SI

Route 1: Cvd

SI p32 · Figure S26 discussion · Figure S26

Metal precursorsCu source, likely Cu(acac)2 by Figure 2b scheme
Linker precursorsBHT powder
Solventsnone for CVD
Additivesno NH3
AtmosphereCVD without NH3
Temperaturenot reported in the assigned documents
Timenot reported in the assigned documents
Substrate orientationSiO2/Si
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu source / Cu(acac)2 indicated in reaction schemeNot specifiedSI p32 · Figure S26 discussion · Figure S26
LinkerBHT powderNot specifiedSI p32 · Figure S26 discussion · Figure S26
Vague recipeSource: Both

Route 2: Cvd

SI p2 and p31 · CVD growth; Figure S25 · Figures 2b, S25

Metal precursorsCu source, likely Cu(acac)2 by Figure 2b scheme; exact route follows previous work
Linker precursorsBHT powder
Solventsnone for CVD
AdditivesNH3 vapour used in this strategy
AtmosphereNH3-assisted CVD
Temperaturenot reported in the assigned documents
Timenot reported in the assigned documents
Substrate orientationSiO2/Si; direct deposition also stated for quartz and flexible polymer substrates
Scalability contextDirect deposition on diverse substrates eliminates transfer-related issues.
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu source / Cu(acac)2 indicated in reaction schemeNot specifiedSI p2 and p31 · CVD growth; Figure S25 · Figures 2b, S25
LinkerBHT powderNot specifiedSI p2 and p31 · CVD growth; Figure S25 · Figures 2b, S25
BaseNH3.H2O solutionNot specifiedSI p2 and p31 · CVD growth; Figure S25 · Figures 2b, S25
Partial recipeSource: SI

Route 3: Cvd

SI p30 · Figure S24 discussion · Figure S24

Metal precursorsCu(acac)2 powders
Linker precursorsHHB powders
Solventsnone for CVD
Additivesno NH3
Atmospherelow-pressure CVD without NH3
TemperatureCu(acac)2 heated at 120 in Cu-HHB route; no-NH3 control not separately specified
Substrate orientationSiO2/Si substrate
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu(acac)2 powdersNot specifiedSI p30 · Figure S24 discussion · Figure S24
LinkerHHB powdersNot specifiedSI p30 · Figure S24 discussion · Figure S24
Partial recipeSource: Both

Route 4: Cvd

SI p2 · CVD growth of 2D c-CPs thin films · Figure S23

Metal precursorsCu(acac)2 powders, copper(II) acetylacetonate
Linker precursorsHHB powders
Solventsnone for CVD
AdditivesNH3 vapour from NH3.H2O solution
AtmosphereNH3-assisted low-pressure CVD
TemperatureHHB zone 200 inferred from Fe-HHB route; Cu(acac)2 heated at 120
Timenot separately stated
Substrate orientationSiO2/Si substrate
Work-upnot separately stated
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu(acac)2 powders (copper(II) acetylacetonate, Sigma-Aldrich Chemie GmbH)Not specifiedSI p2 · CVD growth of 2D c-CPs thin films · Figure S23
LinkerHHB powdersNot specifiedSI p2 · CVD growth of 2D c-CPs thin films · Figure S23
BaseNH3.H2O solutionNot specifiedSI p2 · CVD growth of 2D c-CPs thin films · Figure S23
Partial recipeSource: SI

Route 5: Cvd

SI p2 and p25 · Preparation of NH3.H2O solution; Figure S19 · Figure S19

Metal precursorsFe(acac)3 powders
Linker precursorsHHB powders
Solventsnone for CVD
AdditivesNH3.H2O solution concentration varied from 1.4 mmol/L to 14 mol/L; includes 0 NH3 control
AtmosphereNH3-assisted low-pressure CVD with variable NH3 vapour pressure
TemperatureHHB zone 200; Fe(acac)3 zone 105 for standard Fe-HHB programme
Substrate orientationface-to-face inner tube system
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
BaseNH3.H2O solutions1.4 mmol/L to 14 mol/LSI p2 and p25 · Preparation of NH3.H2O solution; Figure S19 · Figure S19
LinkerHHB powders2 mg in standard Fe-HHB routeSI p2 and p25 · Preparation of NH3.H2O solution; Figure S19 · Figure S19
Metal SourceFe(acac)3 powders20 mg in standard Fe-HHB routeSI p2 and p25 · Preparation of NH3.H2O solution; Figure S19 · Figure S19
Partial recipeSource: Both

Route 6: Cvd

18191 · Introduction / Results and Discussion · Figure 1

Metal precursorsFe(acac)3 powders
Linker precursorsHHB powders
Solventsnone for CVD
Additivesno NH3
AtmosphereN2 / low pressure CVD inferred from Fe-HHB route; NH3 absent
Temperaturenot separately stated; likely same Fe-HHB CVD temperature programme
Timenot separately stated
Substrate orientationSiO2/Si or quartz substrates
Work-upnot separately stated
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
LinkerHHB powdersNot specified18191 · Introduction / Results and Discussion · Figure 1
Metal SourceFe(acac)3 powdersNot specified18191 · Introduction / Results and Discussion · Figure 1
Partial recipeSource: SI

Route 7: Cvd

SI p7-8 · Figure S2 discussion · Figure S2

Metal precursorsFe(acac)3 powders in one 110 mm single-opening tube
Linker precursorsHHB powders in one 110 mm single-opening tube
Solventsnone for CVD
AdditivesNH3 vapour from NH3.H2O container
AtmosphereNH3-assisted low-pressure CVD
Temperaturenot separately stated; configuration variant of Fe-HHB CVD
Substrate orientationsubstrate at gap between equal-length tube openings
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
LinkerHHB powdersNot specifiedSI p7-8 · Figure S2 discussion · Figure S2
Metal SourceFe(acac)3 powdersNot specifiedSI p7-8 · Figure S2 discussion · Figure S2
BaseNH3.H2O solutionNot specifiedSI p7-8 · Figure S2 discussion · Figure S2
Partial recipeSource: SI

Route 8: Cvd

SI p7 · Figure S2 discussion · Figure S2

Metal precursorsFe(acac)3 powders in longer 160 mm tube
Linker precursorsHHB powders in shorter 65 mm tube
Solventsnone for CVD
AdditivesNH3 vapour from NH3.H2O container
AtmosphereNH3-assisted low-pressure CVD
Temperaturenot separately stated; configuration variant of Fe-HHB CVD
Substrate orientationface-to-face inner tube variant
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
LinkerHHB powdersNot specifiedSI p7 · Figure S2 discussion · Figure S2
Metal SourceFe(acac)3 powdersNot specifiedSI p7 · Figure S2 discussion · Figure S2
BaseNH3.H2O solutionNot specifiedSI p7 · Figure S2 discussion · Figure S2
Partial recipeSource: SI

Route 9: Other

SI p27 · Figure S21 caption · Figure S21

Metal precursorspreformed Fe-HHB-w thin film
Linker precursorspreformed Fe-HHB-w thin film
AdditivesNH3 atmosphere provided by 14 mol/L NH3.H2O solution
Atmospherehigh-concentration NH3 atmosphere
Temperatureabout 50
Substrate orientationthin film on substrate
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
BaseNH3.H2O solution14 mol/LSI p27 · Figure S21 caption · Figure S21
Otherfreshly-synthesized Fe-HHB-wNot specifiedSI p27 · Figure S21 caption · Figure S21
Partial recipeSource: SI

Route 10: Cvd

SI p8 · Figure S2 discussion · Figure S2

Metal precursorsFe(acac)3 powders on quartz boat
Linker precursorsHHB powders on quartz boat
Solventsnone for CVD
AdditivesNH3 vapour from NH3.H2O container
AtmosphereNH3-assisted low-pressure CVD
Temperaturenot separately stated; configuration variant of Fe-HHB CVD
Substrate orientationconventional quartz boats without face-to-face inner tube system
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
LinkerHHB powdersNot specifiedSI p8 · Figure S2 discussion · Figure S2
Metal SourceFe(acac)3 powdersNot specifiedSI p8 · Figure S2 discussion · Figure S2
BaseNH3.H2O solutionNot specifiedSI p8 · Figure S2 discussion · Figure S2
Complete recipeSource: Both

Route 11: Cvd

SI p2 · CVD growth of 2D c-CPs thin films · Figure S1

Metal precursors20 mg Fe(acac)3 powders, iron(III) acetylacetonate
Linker precursors2 mg HHB powders, hexahydroxybenzene
Solventsnone for CVD; substrates cleaned with acetone, ethanol and DI water
AdditivesNH3 vapour released from 0.14 mol/L NH3.H2O solution for optimal Fe-HHB-w growth
Atmosphere200 sccm N2 purge, pumped to low pressure about 0.5 mbar; NH3 vapour introduced
TemperatureHHB zone 200; Fe(acac)3 zone 105; ramp 5 min
Time0.167-6
Substrate orientationSiO2/Si or quartz substrates placed in the longer tube about 70 mm from HHB powder
Work-upCool down to room temperature before stopping the pump.
Scalability contextUniform films over about 1 cm2 substrate areas; compatible with device fabrication.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
LinkerHHB powders (HHB = hexahydroxybenzene, TCI Deutschland GmbH)2 mgSI p2 · CVD growth of 2D c-CPs thin films · Figure S1
Metal SourceFe(acac)3 powders (iron(III) acetylacetonate, BLD Pharmatech GmbH)20 mgSI p2 · CVD growth of 2D c-CPs thin films · Figure S1
BaseNH3.H2O solution diluted from 25% ammonia solutioncontainer with small syringe-needle opening · 0.14 mol/L for optimal Fe-HHB-w; broader range 1.4 mmol/L to 14 mol/LSI p2 · CVD growth of 2D c-CPs thin films · Figure S1
OtherN2 purge gas200 sccmSI p2 · CVD growth of 2D c-CPs thin films · Figure S1