AFM topographical scan
patterned Cu electrode on p-type Si(100) · Electrode
5 x 5 um area of as-deposited Cu layer before nanoarray growth.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| RMS roughness of as-deposited Cu | RMS ~ 6 nm | — | ~ | Text Approximate | 4 · 2.1 Material Characterization · Figure 2d |