Microscopy Morphology — Sub-Femtomolar, Label-Free Small-Molecule Sensing with Nanoarchitectonic Metal-Organic Frameworks

Measurement evidence

Microscopy Morphology

Sub-Femtomolar, Label-Free Small-Molecule Sensing with Nanoarchitectonic Metal-Organic Frameworks · Le K.T.M., Nguyen C.M., Jamali S. et al. · Advanced Materials Technologies · 2026 · e01751

3 measurement groups · 6 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

AFM topographical scan

patterned Cu electrode on p-type Si(100) · Electrode

5 x 5 um area of as-deposited Cu layer before nanoarray growth.

Atmosphere
not reported
Geometry
patterned electrode surface
Context
Cu precursor surface
Measurement source
4 · 2.1 Material Characterization · Figure 2d
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
RMS roughness of as-deposited CuRMS ~ 6 nm~Text
Approximate
4 · 2.1 Material Characterization · Figure 2d

AFM, SEM and EDS mapping

CuHITP/Cu(OH)2 extended-gate electrode · Electrode

Converted CuHITP film morphology and elemental incorporation after solid-phase conversion.

Atmosphere
not reported
Geometry
converted nanoarray film on electrode
Context
CuHITP/Cu(OH)2 heterostructure
Measurement source
4 · 2.1 Material Characterization · Figure 2f,j-l
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
RMS roughness of converted CuHITP filmRMS ~ 381 nm~Text
Approximate
4 · 2.1 Material Characterization · Figure 2f
EDS evidence for HATP ligand incorporationsignificant increase in C content and appearance of NQualitative
Qualitative
4 · 2.1 Material Characterization · Figure 2h,k; Figures S5-S6
CuHITP converted structure widtharound 200 nmaroundText
Approximate
4 · 2.1 Material Characterization · Figure 2j

AFM and SEM

Cu(OH)2 nanoarray on patterned electrode · Electrode

Cu(OH)2 nanoarray morphology after APS/NaOH growth.

Atmosphere
not reported
Geometry
nanoarray on patterned electrode
Context
Cu(OH)2 precursor/template
Measurement source
4 · 2.1 Material Characterization · Figure 2e,g,i
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
RMS roughness of Cu(OH)2 nanoarrayRMS ~ 552 nm~Text
Approximate
4 · 2.1 Material Characterization · Figure 2e
Cu(OH)2 tubular structure widthabout 100 nmaboutText
Approximate
4 · 2.1 Material Characterization · Figure 2g