Diffraction Structure — Emergence of Metallic Conductivity in Ordered One-Dimensional Coordination Polymer Thin Films upon Reductive Doping

Measurement evidence

Diffraction Structure

Emergence of Metallic Conductivity in Ordered One-Dimensional Coordination Polymer Thin Films upon Reductive Doping · Nisula M., Karttunen A.J., Solano E. et al. · ACS Applied Materials and Interfaces · 2021 · 10249-10256

3 measurement groups · 5 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

In situ GIWAXS during H2/He annealing

H2/He-reduced Cu-DMD film on interdigitated electrode array · Electrode

Heating stage in stainless-steel chamber with Kapton windows; 170 deg C for 130 min to 2 h under 5% H2/He

Temperature
443
Atmosphere
5% H2/He, 500 sccm, 1 bar
Context
Cu-DMD during reductive doping
Measurement source
p008 / SI p.7 · Supporting Information · Figure S12
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
GIWAXS d-value shift during H2 annealingmain peak shifts to slightly lower d-value, around 0.8 nmaroundCaption
Approximate
p008 / SI p.7 · Supporting Information · Figure S12
No new crystalline phase during annealingNo new crystalline phases are formed during the annealing processText
Qualitative
p005 / article p.10253 · Results and Discussion · Figure S12

GIWAXS substrate-orientation comparison

Cu-DMD film on TiN-coated Si · Thin Film

Cu-DMD films deposited on TiN-coated and Pt-coated Si compared with native-oxide Si

Atmosphere
Air for ex situ samples
Context
Pristine Cu-DMD films on alternative substrates
Measurement source
p004 / article p.10252 · Results and Discussion · Figure S6
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Substrate-dependent orderingTiN-coated Si gives more spread scattering; Pt-coated substrate gives significantly weaker orderingText
Qualitative
p004 / article p.10252 · Results and Discussion · Figure S6a,b; Figure S4e,f

XRD and grazing-incidence wide-angle X-ray scattering (GIWAXS)

As-deposited Cu-DMD thin film on Si(100) with native oxide · Thin Film

Ex situ GIWAXS at NCD-SWEET beamline; 12.4 keV, incident angle 0.15 deg; XRD compared with calculated pattern

Atmosphere
Air for ex situ GIWAXS
Context
As-deposited Cu-DMD thin film on Si native oxide
Measurement source
p003 / article p.10251 · Experimental Section · Figure 1c,d
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Out-of-plane orientationBragg reflection intensity concentrated along qz axis, indicating strong out-of-plane orientationText
Qualitative
p004 / article p.10252 · Results and Discussion · Figure 1d
Experimental Cu-DMD diffraction d-spacingsingle prominent diffraction peak corresponding to d = 8.2 AText
Rounded Reported
p003 / article p.10251 · Results and Discussion · Figure 1c