Atomic force microscopy (AFM), tapping mode
As-deposited Cu-DMD thin film on Si(100) with native oxide · Thin Film
Bruker Dimension Edge AFM
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Bare Si RMS roughness comparator | 0.1 nm RMS roughness | — | — | Text Exact Reported | p003 / article p.10251 · Results and Discussion |
| As-deposited film RMS roughness | 0.27 nm RMS roughness | — | — | Text Exact Reported | p003 / article p.10251 · Results and Discussion · Figure S4a,b |