Electrical Transport — Emergence of Metallic Conductivity in Ordered One-Dimensional Coordination Polymer Thin Films upon Reductive Doping

4 measurement groups · 10 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

O2-treated Cu-DMD after H2 reduction · Electrode

H2-treated Cu-DMD exposed to ambient air; separately annealed in flowing O2 at 80-130 deg C and then exposed to air

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Maximum conductivity after short air exposureMarked as a best value within this paper	up to 10^-2 S cm^-1	—	up to	Text Approximate	p004 / article p.10252 · Results and Discussion · Figure S9a
Conductivity after O2 annealing	10^-9 S cm^-1	—	—	Text Rounded Reported	p005 / article p.10253 · Results and Discussion · Figure S9b

H2/He-reduced Cu-DMD film on interdigitated electrode array · Electrode

Autolab PGSTAT702 potentiostat; voltage sweep -0.5 to 0.5 V starting from 0 V; conductivity estimated from IDA geometry

Temperature: 443
Atmosphere: Flowing 5% H2/He, 0.5 mL/min
Geometry: IDA, Au, 5 um electrode width, 5 um gap
Context: Cu-DMD film transitions from as-deposited low-conductivity state to H2-reduced doped high-conductance state
Measurement source: p003 / article p.10251 · Experimental Section · Figure 2a; Figure S7

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
As-deposited room-temperature conductivity	<10^-10 S cm^-1	—	upper bound	Text Range	p004 / article p.10252 · Results and Discussion · Figure S8
As-deposited transport regime	Linear log(sigma) versus T^-1/4, indicative of variable-range hopping-type conduction	—	—	Text Qualitative	p004 / article p.10252 · Results and Discussion · Figure S8a,b
Overall conductivity increase	ca. 8 orders of magnitude	—	ca.	Text Approximate	p004 / article p.10252 · Results and Discussion · Figure S9a
Conductivity after H2 annealing	around 3 x 10^-3 S cm^-1	—	around	Text Approximate	p004 / article p.10252 · Results and Discussion · Figure 2a

H2/He-reduced Cu-DMD film on interdigitated electrode array · Electrode

Four-electrode geometry width 1 mm and spacing 0.6 mm; impedance Bode plots on IDA arrays in low and high conductivity states

Geometry: 4-electrode test sample; IDA impedance sample
Context: As-deposited low-conductivity and H2-reduced high-conductivity Cu-DMD
Measurement source: p007 / SI p.6 · Supporting Information · Figure S10

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Four-electrode verification film thickness	Film thickness is 19 nm	—	—	Caption Exact Reported	p007 / SI p.6 · Supporting Information · Figure S10
Low- and high-conductivity AC response	Low-conductivity state almost purely capacitive; high-conductivity state purely resistive	—	—	Text Qualitative	p005 / article p.10253 · Results and Discussion · Figure S10b,c

H2/He-reduced Cu-DMD film on interdigitated electrode array · Electrode

Two-terminal current-biased configuration; excitation current 1 uA; high-conductance state only

Temperature: 2-300
Atmosphere: Post-H2-treated sample; air-exposure stages also measured
Geometry: Two-terminal current-biased device
Context: H2-reduced doped Cu-DMD
Measurement source: p003 / article p.10251 · Experimental Section · Figure 2b; Figure S11

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Metallic behaviour temperature range	2-300 K	—	—	Text Range	p005 / article p.10253 · Results and Discussion · Figure 2b
Approximate high-conductance resistance range	approximately 60 Ohm at low temperature to 105 Ohm at 300 K from Figure 2b	—	visual estimate from axis; +/-5 Ohm	Figure Axis Approximate	p004 / article p.10252 · Figure · Figure 2b