Spectroscopy — Emergence of Metallic Conductivity in Ordered One-Dimensional Coordination Polymer Thin Films upon Reductive Doping

4 measurement groups · 10 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

As-deposited Cu-DMD thin film on Si(100) with native oxide · Thin Film

Thermo Scientific Theta Probe, Al K alpha radiation, no Ar+ depth profiling; angle-resolved XPS for depth distribution

Context: As-deposited pristine Cu-DMD film
Measurement source: p002 / article p.10250 · Experimental Section · Figure S2

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Oxygen impurity	1.8 at % oxygen	—	—	Text Rounded Reported	p003 / article p.10251 · Results and Discussion · Figure S2
Nominal XPS composition	CuC4.1S2.3N1.8	—	—	Text Rounded Reported	p003 / article p.10251 · Results and Discussion · Figure S2

As-deposited Cu-DMD thin film on Si(100) with native oxide · Thin Film

Bruker VERTEX 70 V with DTGS detector; blank Si wafer background subtracted

Context: As-deposited and H2-treated Cu-DMD films
Measurement source: p002 / article p.10250 · Experimental Section · Figure S3; Figure S17

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
New N-H stretching band after H2 treatment	New absorption band in region typical for amine N-H stretching mode	—	—	Text Qualitative	p005 / article p.10253 · Results and Discussion · Figure S17
FTIR target polymer confirmation	FTIR confirms formation of target coordination polymer, matching prior Cu-DMD spectrum	—	—	Text Qualitative	p003 / article p.10251 · Results and Discussion · Figure S3

Cu-DMD film on quartz for UV-vis-NIR · Thin Film

Perkin Elmer Lambda 1050 with integrating sphere; PMT/InGaAs detectors; 15 nm films on quartz

Context: As-deposited and H2/He-annealed Cu-DMD optical comparison
Measurement source: p003 / article p.10251 · Experimental Section · Figure S18

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
NIR reflectance increase after annealing	Decrease in transmission from 1000 to 2500 nm is ascribed to increased reflectance	—	—	Text Range	p005 / article p.10253 · Results and Discussion · Figure S18
As-deposited transmittance minimum	379 nm	—	—	Text Exact Reported	p005 / article p.10253 · Results and Discussion · Figure S18a

H2/He-reduced Cu-DMD film on interdigitated electrode array · Electrode

Cu 2p3/2, N 1s, S 2p, and C 1s spectra at H2 annealing times 0, 30, 60, and 180 min

Atmosphere: H2/He annealing prior to XPS
Context: Cu-DMD during reductive doping
Measurement source: p009-p012 / SI p.8-p.11 · Supporting Information · Figures S13-S16

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Cu(I) fraction increases with H2 annealing	Proportion of Cu1+ increases with increasing annealing time in H2/He	—	—	Text Qualitative	p005 / article p.10253 · Results and Discussion · Figure S13
Secondary N 1s component	Secondary nitrogen component at 400.2 eV grows after H2 annealing	—	—	Caption Exact Reported	p010 / SI p.9 · Supporting Information · Figure S14
S 2p FWHM after 3 h annealing	1.25 eV for sample annealed for 3 h	—	—	Text Exact Reported	p005 / article p.10253 · Results and Discussion · Figure S15
S 2p FWHM before annealing	1.05 eV	—	—	Text Exact Reported	p005 / article p.10253 · Results and Discussion · Figure S15