Synthesis · Oriented Growth of In-Oxo Chain Based Metal-Porphyrin Framework Thin Film for High-Sensitive Photodetector

4 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Complete recipeSource: Both

Route 1: Other

5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film

Metal precursorsindium nitrate / In(NO3)3

Linker precursorsTCPP, 5,10,15,20-tetra(4-carboxyphenyl)porphyrin

Solventsethanol for diluted precursor solutions and rinsing

AdditivesNaOH and 30% H2O2 used for substrate OH-functionalisation

Atmospheredried under nitrogen flux after substrate functionalisation; growth atmosphere not reported

Temperature80 for substrate functionalisation; room temperature not explicitly reported for LPE dipping

Time0.333 h In(NO3)3 immersion and 0.5 h TCPP immersion per cycle; 0.5 h substrate functionalisation

Substrate orientationOH-functionalised SiO2/Si; [021] orientation perpendicular to the substrate in the resulting SURMOF

Oxidant / reductant30% hydrogen peroxide in substrate pretreatment

Work-upEach precursor immersion step followed by rinsing with pure ethanol to remove residual reactants.

Activationnot reported

Scalability contextLayer-by-layer cycles tune thickness from approximately 60 to 240 nm for 5-20 cycles.

Show 5 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	indium nitrate	1 mM	5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Linker	TCPP	0.1 mM	5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Solvent	ethanol	Not specified	5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Base	NaOH solution	mixture with 30% hydrogen peroxide, ratio 3:1 · 2 mM	5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Oxidant	hydrogen peroxide	mixture with 2 mM NaOH, ratio 3:1 · 30%	5 · Fabrication of In-TCPP SURMOF and mix-oriented thin film

Complete recipeSource: SI

Route 2: Solvothermal

5-6 · Fabrication of In-TCPP SURMOF and mix-oriented thin film

Metal precursorsIndium nitrate (150 mg, 0.5 mmol)

Linker precursors5,10,15,20-tetra(4-carboxyphenyl)porphyrin (TCPP) (158 mg, 0.2 mmol)

SolventsDMF (10 mL); DMF and ethanol wash

Atmospheresealed glass bottle; vacuum drying after wash

Temperature120

Time24

Substrate orientationfunctional substrate in solution; final mixed-orientation film assembled on SiO2/Si substrate

Work-upWashed with DMF and ethanol in turn.

Activationdried in vacuum at 60 deg C

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Indium nitrate	150 mg, 0.5 mmol	5-6 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Linker	5,10,15,20-tetra(4-carboxyphenyl) porphyrin (TCPP)	158 mg, 0.2 mmol	5-6 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Solvent	DMF	10 ml	5-6 · Fabrication of In-TCPP SURMOF and mix-oriented thin film
Solvent	ethanol	wash	5-6 · Fabrication of In-TCPP SURMOF and mix-oriented thin film

Partial recipeSource: SI

Route 3: Other

6 · Fabrication of In-TCPP based photodetector · Figure 3a

Metal precursorssilver electrode vapour

Additivescopper interdigital electrode grid as shadow mask

Atmospherethermal evaporation chamber

Substrate orientationAg electrodes patterned on the surface of the MOF thin film

Show 2 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	silver	Ag vapors	6 · Fabrication of In-TCPP based photodetector · Figure 3a
Other	copper interdigital electrode grids	shadow mask	6 · Fabrication of In-TCPP based photodetector · Figure 3a

Partial recipeSource: SI

Route 4: Other

6 · in-situ monitoring the growth process of In-TCPP SURMOF · Figure S2

Metal precursorsIn(NO3)3 solution

Linker precursorsTCPP solution

Solventsethanol baseline and rinse

Additives11-mercapto-1-undecanol SAM on Au chip

Atmosphereliquid phase flow module; atmosphere not reported

Temperature50

Substrate orientationMUD SAM-functionalised Au-coated QCM working electrode

Work-upPure ethanol used for baseline and rinsing between precursor flows.

Activationnot reported

Scalability contextQCM-D monitoring experiment rather than preparative device route.

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	In(NO3)3	1 mM	6 · in-situ monitoring the growth process of In-TCPP SURMOF · Figure S2
Linker	TCPP	0.2 mM, equimolar	6 · in-situ monitoring the growth process of In-TCPP SURMOF · Figure S2
Solvent	ethanol	baseline and rinsing step	6 · in-situ monitoring the growth process of In-TCPP SURMOF · Figure S2
Additive	11-mercapto-1-undecanol (MUD) SAM	Not specified	6 · in-situ monitoring the growth process of In-TCPP SURMOF · Figure S2