PXRD in reflection mode, CuKalpha1 radiation
EPD-MOF-525 · Thin Film
Compared with simulated MOF-525 and powder patterns; low-angle check for PCN-222 in SI
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| relative PXRD intensity/orientation interpretation | EPD-MOF-525 more random orientations than ST-MOF-525 | — | — | Text Qualitative | 3 · Film Characterization · Figure 2 |
| PXRD phase assignment | matches simulated MOF-525; low-angle PCN-222 peak absent | — | — | Text Qualitative | 3 · Film Characterization · Figure 2; Figure S1 |