cMOF Evidence Base
Microscopy Morphology — MOF-enabled high-density 2D molecular crystal optoelectronic memory transistor with floating gate architecture

Measurement evidence

Microscopy Morphology

MOF-enabled high-density 2D molecular crystal optoelectronic memory transistor with floating gate architecture · Gao S., Ren Y., Zhang D. et al. · Journal of Materials Chemistry C · 2024 · 6943-6951

2 measurement groups · 8 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

OM, POM, TEM, SAED and AFM

Transmission electron microscopyAtomic force microscopy

Pristine DTT-8 two-dimensional molecular crystal film · Single Crystal

Morphology, crystallinity, roughness and thickness of DTT-8 2D molecular crystal.

Geometry
DTT-8 2D molecular crystal film.
Context
Pristine DTT-8 active-layer component.
Measurement source
main p.3, article p.6945 · 2.2 Preparation and characterization of 2DMCs · Fig. 2
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
DTT-8 2DMC AFM surface roughness0.45 nm0.45 nm—Text
Exact Reported		main p.3, article p.6945 · 2.2 Preparation and characterization of 2DMCs · Fig. 2f
DTT-8 2DMC AFM thickness10.5 nm10.5 nm—Text
Exact Reported		main p.3, article p.6945 · 2.2 Preparation and characterization of 2DMCs · Fig. 2f

Optical microscopy, SEM, TEM, HRTEM and AFM

Scanning electron microscopyTransmission electron microscopyAtomic force microscopy

Pristine 2D Cu3(HHTP)2 MOF thin film · Thin Film

Morphology and thickness/roughness characterisation of transferred Cu3(HHTP)2 MOF films.

Geometry
Thin film on Si/SiO2 substrate for optical/SEM/AFM; TEM/HRTEM for crystalline film.
Context
Pristine conductive-MOF film before device integration.
Measurement source
main p.2-3, article pp.6944-6945 · 2.1 Preparation and characterization of 2D MOF films · Fig. 1c-f and Fig. S4
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Cu3(HHTP)2 AFM roughness maximum across six sites1.06 nm maximum labelled roughness1.06 nm—Visual Estimate
Approximate		SI p.3 · Figure S4 · Fig. S4
Cu3(HHTP)2 AFM roughness minimum across six sites0.96 nm minimum labelled roughness0.96 nm—Visual Estimate
Approximate		SI p.3 · Figure S4 · Fig. S4
Cu3(HHTP)2 AFM thickness maximum across six sites20.7 nm maximum among labelled sites20.7 nm—Visual Estimate
Approximate		SI p.3 · Figure S4 · Fig. S4
Cu3(HHTP)2 AFM thickness minimum across six sites19.5 nm minimum among labelled sites19.5 nm—Visual Estimate
Approximate		SI p.3 · Figure S4 · Fig. S4
Crack-free transferable Cu3(HHTP)2 film sizecentimeter-scale film without any cracks——Text
Qualitative		main p.2, article p.6944 · 2.1 Preparation and characterization of 2D MOF films · Fig. 1b
Cu3(HHTP)2 HRTEM lattice spacing1.8 nm1.8 nm—Text
Rounded Reported		main p.2, article p.6944 · 2.1 Preparation and characterization of 2D MOF films · Fig. 1f