Synthesis · MOF-enabled high-density 2D molecular crystal optoelectronic memory transistor with floating gate architecture

3 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Both

Route 1: Air Liquid Interface

main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3

Metal precursorsCopper(II) acetate monohydrate, 10 mg in 100 mL deionised water.

Linker precursorsHHTP powder, 1 mg in 10 mL EA:MB:DMSO mixed solvent.

SolventsDeionised water; ethyl acetate:methyl benzene:dimethyl sulfoxide = 8:1:1.

AdditivesDimethyl sulfoxide in the organic ligand solution.

AtmosphereNot specified.

Substrate orientationFilm forms on water surface and is transferred to Si/SiO2 or target substrates.

Work-upSlowly drop HHTP solution onto the copper acetate aqueous solution; self-assemble on water surface; transfer film to substrate for testing and characterisation.

ActivationNo activation reported.

Scalability contextCentimetre-scale crack-free films were obtained and transferred onto Si/SiO2.

Show 5 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Copper(II) acetate monohydrate (C4H6CuO4.H2O)	10 mg · in 100 mL deionized water	main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3
Linker	2,3,6,7,10,11-Hexahydroxytriphenylene hydrate / HHTP powder	1 mg · in 10 mL mixed solvent	main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3
Solvent	Deionized water	100 mL	main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3
Solvent	Ethyl acetate:methyl benzene:dimethyl sulfoxide	10 mL · EA:MB:DMSO = 8:1:1	main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3
Additive	Dimethyl sulfoxide	part of 8:1:1 mixed solvent	main p.7, article p.6949 · Preparation of 2D MOF films · Fig. 1a and Fig. S1-S3

Partial recipeSource: Main

Route 2: Other

main p.7-8, article pp.6949-6950 · Preparation of 2DMC · Fig. 2 and Fig. S8-S9

SolventsChlorobenzene DTT-8 solution; glycerol liquid substrate.

AdditivesA surfactant solution is mentioned in the discussion, but surfactant identity and amount are not specified in the experimental recipe.

AtmosphereAtmospheric environment.

Temperature16

Substrate orientationGlycerol liquid surface.

Work-upSlowly drip DTT-8 solution onto glycerol; allow chlorobenzene to evaporate completely to obtain DTT-8 2DMC on glycerol surface.

ActivationNo activation reported.

Scalability contextMillimetre-sized large-area DTT-8 2D molecular crystals are described.

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	DTT-8	50 uL of solution · 1 mg mL-1 in chlorobenzene	main p.7-8, article pp.6949-6950 · Preparation of 2DMC · Fig. 2 and Fig. S8-S9
Solvent	Chlorobenzene	DTT-8 solution solvent	main p.7-8, article pp.6949-6950 · Preparation of 2DMC · Fig. 2 and Fig. S8-S9
Solvent	Glycerol	25 mL · liquid substrate	main p.7-8, article pp.6949-6950 · Preparation of 2DMC · Fig. 2 and Fig. S8-S9
Additive	surfactant solution	not specified · not specified	main p.7-8, article pp.6949-6950 · Preparation of 2DMC · Fig. 2 and Fig. S8-S9

Complete recipeSource: Both

Route 3: Other

main p.8, article p.6950 · Device fabrication · Fig. S10

Metal precursorsPreformed Cu3(HHTP)2 MOF film and Au electrodes.

Linker precursorsPreformed DTT-8 2DMC.

SolventsDeionised water, acetone and isopropanol cleaning solvents; PMMA in chlorobenzene.

AdditivesPMMA blocking layer.

AtmosphereDevice measurements in air at room temperature; fabrication atmosphere not otherwise specified.

Temperature120

Time0.5

Substrate orientationSiO2 (300 nm)/Si substrate; bottom-gate/top-contact configuration.

Oxidant / reductantOxygen plasma treatment of SiO2/Si substrate.

Work-upUltrasonic cleaning with deionised water, acetone and isopropanol for 10 min each; oxygen plasma; transfer MOF film; spin-coat PMMA; anneal; invert substrate over DTT-8 on glycerol; fish out substrate and rinse glycerol from 2DMC with deionised water; stamp Au electrodes.

ActivationPMMA annealed at 120 C for 30 min.

Scalability contextLayer-by-layer assembly also used for a 3 x 3 pixel array.

Show 7 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	SiO2 (300 nm)/Si wafers	substrate	main p.8, article p.6950 · Device fabrication · Fig. S10
Solvent	Deionised water	cleaning and glycerol rinse	main p.8, article p.6950 · Device fabrication · Fig. S10
Solvent	Acetone	ultrasonic cleaning for 10 min	main p.8, article p.6950 · Device fabrication · Fig. S10
Solvent	Isopropanol	ultrasonic cleaning for 10 min	main p.8, article p.6950 · Device fabrication · Fig. S10
Other	PMMA	10 mg mL-1 in chlorobenzene	main p.8, article p.6950 · Device fabrication · Fig. S10
Solvent	Chlorobenzene	PMMA solvent	main p.8, article p.6950 · Device fabrication · Fig. S10
Other	Au electrodes	two pieces, 120 nm thickness	main p.8, article p.6950 · Device fabrication · Fig. S10