Metal precursorsCu(NO3)2 aqueous mixture, 5 mM
Linker precursorsBHT in degassed dichloromethane, saturated solution 0.24 mM, 20 mL
SolventsDegassed dichloromethane; degassed water; Milli-Q water
AdditivesNaBr, 1 mM in aqueous mixture
AtmosphereArgon; sealed bottle filled with argon gas; solvents degassed by freeze-thaw method
TemperatureRoom temperature implied; not explicitly stated for synthesis
Substrate orientationOil-water interface; transfer to substrates after film formation
Oxidant / reductantCu(II) nitrate acts as metal source; XPS indicates Cu(II) reduced during formation
Work-upAs-prepared film transferred onto substrate and cleaned with ethanol and acetone; device films additionally rinsed with deionized water and methylene chloride.
ActivationNo activation reported.
Scalability contextContinuous films larger than 1 cm2 were obtained.
Show 5 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|
| Metal Source | Cu(NO3)2 | 5 mM | main p.6 · Methods: Synthesis of Cu-BHT thin film · Fig. 1 |
| Linker | BHT (benzenehexathiol) | 20 ml saturated solution · 0.24 mM | main p.6 · Methods: Synthesis of Cu-BHT thin film · Fig. 1 |
| Solvent | dichloromethane | 20 ml BHT solution | main p.6 · Methods: Synthesis of Cu-BHT thin film · Fig. 1 |
| Solvent | water | 20 ml degassed water layer | main p.6 · Methods: Synthesis of Cu-BHT thin film · Fig. 1 |
| Additive | NaBr | 1 mM | main p.6 · Methods: Synthesis of Cu-BHT thin film · Fig. 1 |