Electrical Transport — Interfacial Synthesis of Layer-Oriented 2D Conjugated Metal-Organic Framework Films toward Directional Charge Transport

Measurement evidence

Electrical Transport

Interfacial Synthesis of Layer-Oriented 2D Conjugated Metal-Organic Framework Films toward Directional Charge Transport · Wang Z., Walter L.S., Wang M. et al. · Journal of the American Chemical Society · 2021 · 13624-13632

6 measurement groups · 27 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Conductive AFM local vertical transport

Cu2[PcCu-O8] local vertical c-AFM sample · Thin Film

Icon AFM c-AFM mode, ambient pressure, room temperature; SCM-PIT-V2 PtIr tip k = 2.8 N m^-1; tip voltages 1-4 V; silver layer grounded; contact area about 100 nm2

Temperature
room temperature
Atmosphere
Ambient pressure
Geometry
PtIr AFM tip/Cu2[PcCu-O8]/Ag vertical contact
Context
MOF film on silver electrode
Measurement source
SI p. 10-11 · Vertical transport · Scheme S6; Figure S20
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Lateral-to-vertical conductivity ratio upper boundMarked as a best value within this paper10^3-foldrange upper boundText
Range
p. 5 · Charge Transport Properties · Figure 3h
Lateral-to-vertical conductivity ratio lower boundMarked as a best value within this paper10^2-foldrange lower boundText
Range
p. 5 · Charge Transport Properties · Figure 3h
c-AFM tip-film contact areaabout 100 nm^2Text
Approximate
SI p. 10-11 · Vertical transport · Scheme S6
c-AFM sample mean film thicknessd = 19 +/- 3 nm+/- 3 nmText
Exact Reported
SI p. 11 · Vertical transport · Scheme S7
c-AFM point 1 fitted conductivityabout 1.7 x 10^-5 S cm^-1 from Scheme S6 labelFigure Axis
Approximate
SI p. 11 · Vertical transport · Scheme S6a
c-AFM point 2 fitted conductivityabout 1.4 x 10^-5 S cm^-1 from Scheme S6 labelFigure Axis
Approximate
SI p. 11 · Vertical transport · Scheme S6a
c-AFM point 3 fitted conductivityabout 0.8 x 10^-5 S cm^-1 from Scheme S6 labelFigure Axis
Approximate
SI p. 11 · Vertical transport · Scheme S6a
c-AFM point 4 fitted conductivityabout 1.4 x 10^-5 S cm^-1 from Scheme S6 labelFigure Axis
Approximate
SI p. 11 · Vertical transport · Scheme S6a
Local vertical c-AFM conductivity lower bound10^-6 S cm^-1range lower boundText
Range
p. 5 · Charge Transport Properties · Figure 3g
Local vertical c-AFM conductivity upper bound10^-5 S cm^-1range upper boundText
Range
p. 5 · Charge Transport Properties · Figure 3g

Van der Pauw Hall effect

Cu2[PcCu-O8] macroscopic van der Pauw device · Thin Film

Room temperature 300 K; perpendicular magnetic field swept from -4 T to 4 T

Temperature
300
Geometry
Macroscopic van der Pauw Hall geometry
Context
Pristine Cu2[PcCu-O8] film
Measurement source
SI p. 6-9 · Hall measurements · Scheme S3; Scheme S4; Figure 3c
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Hole concentrationabout 7.33 x 10^14 cm^-3Text
Approximate
p. 5 · Charge Transport Properties · Figure 3c
Hall mobilityMarked as a best value within this paper4.4 +/- 0.7 cm^2 V^-1 s^-1+/- 0.7 cm^2 V^-1 s^-1Text
Exact Reported
p. 5 · Charge Transport Properties · Figure 3c
Carrier polarityp-type semiconducting behaviourQualitative
Qualitative
p. 5 · Charge Transport Properties · Figure 3c

Local lateral two-probe measurement in FET-style h-BN device

Cu2[PcCu-O8] local lateral h-BN/FET contact device · Thin Film

Contacts separated 100-500 nm, widths 8 um; representative 400 nm pair; measured in LakeShore Probe station CRX-VF at room temperature and 3e-5 mbar with two Keithley 2450 source meters

Temperature
room temperature
Atmosphere
3e-5 mbar
Geometry
h-BN/SiO2/Si substrate; Ti/Au contacts by electron-beam lithography
Context
MOF active layer on h-BN device support
Measurement source
SI p. 9-10 · Lateral transport · Figure S19
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Local lateral contact distance upper bound500 nmText
Exact Reported
p. 5 · Charge Transport Properties · Figure 3f; Figure S19
Local lateral contact distance lower bound100 nmText
Exact Reported
p. 5 · Charge Transport Properties · Figure 3f; Figure S19
Field effect observationNo field effect up to +/-120 V gate voltageText
Exact Reported
SI p. 10 · Lateral transport
Local lateral conductivity, representative 400 nm pairMarked as a best value within this paperabout 2 x 10^-3 S cm^-1Text
Approximate
p. 5 · Charge Transport Properties · Figure 3g; Figure S19

Two-probe lateral conductivity on 10 devices

Cu2[PcCu-O8] edge-on MOF film · Thin Film

Ten two-probe devices with 300 um channel length

Geometry
Two-probe lateral; channel length 300 um
Context
Pristine Cu2[PcCu-O8] film in lateral devices
Measurement source
p. 4 · Charge Transport Properties · Figure S17
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Lateral two-probe conductivity for 300 um devicesabout 3 x 10^-4 S cm^-1Text
Approximate
p. 4 · Charge Transport Properties · Figure S17

Van der Pauw DC conductivity

Cu2[PcCu-O8] macroscopic van der Pauw device · Thin Film

Lakeshore Hall System 9700A; current scanned -10 nA to 10 nA; temperatures 256-310 K

Temperature
256-310
Geometry
Macroscopic square van der Pauw; lateral contact separation about 1 cm; contact size 0.1 cm in SI scheme
Context
Pristine Cu2[PcCu-O8] film
Measurement source
SI p. 6 · Variable-temperature conductivity and Hall effect measurements · Scheme S1; Figure S15; Figure S16
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Arrhenius activation energyabout 285 meV0.285 eVText
Approximate
p. 5 · Charge Transport Properties · Figure S16
Macroscopic lateral conductivity near 256 Kabout 1.0 x 10^-4 S cm^-1 from Figure 3b axisFigure Axis
Uncertain
p. 4 · Charge Transport Properties · Figure 3b
Macroscopic lateral conductivity at 300 KMarked as a best value within this paper5.6 x 10^-4 S cm^-1Text
Rounded Reported
p. 5 · Charge Transport Properties · Figure 3b
Macroscopic lateral conductivity near 310 Kabout 8.5 x 10^-4 S cm^-1 from Figure 3b axisFigure Axis
Uncertain
p. 4 · Charge Transport Properties · Figure 3b

Macroscopic vertical DC device

Cu2[PcCu-O8] macroscopic vertical device · Thin Film

Gold top contacts; thickness varied 20-250 nm; area about 1.3e-3 cm2; resistance fitted from -1 to +1 V; 2Rc about 2600 ohm cm subtracted

Temperature
300
Geometry
Top-bottom vertical device, L = film thickness, A about 1.3e-3 cm2
Context
Pristine Cu2[PcCu-O8] film in vertical device
Measurement source
SI p. 9 and p. 31 · Macroscopic vertical devices · Figure S18
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Vertical-device contact areaabout 1.3 x 10^-3 cm^2Text
Approximate
SI p. 9 · Macroscopic vertical devices · Figure S18
Vertical-device contact resistance correctionabout 2600 ohm cmText
Approximate
SI p. 9 · Macroscopic vertical devices
Macroscopic vertical conductivityMarked as a best value within this paperon the order of about 10^-6 S cm^-1order-of-magnitudeText
Approximate
p. 5 · Charge Transport Properties · Figure 3d,e
Vertical-device thickness series upper bound250 nmText
Exact Reported
p. 5 · Charge Transport Properties · Figure 3e; Figure S18
Vertical-device thickness series lower bound20 nmText
Exact Reported
p. 5 · Charge Transport Properties · Figure 3e; Figure S18