| Co3(HHTP)2 film on Au electroderesearch_0617__mat__co3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.30 V for 60 min.Au electrode · Not reported. | SI p.34 · Supplementary data · Fig. S31 |
| Ag-electroplated Cu3(HHTP)2 film electroderesearch_0617__mat__cu3_hhtp2 | Electrode · Composite Sample · Composite | Cu3(HHTP)2 film used as electrode for Ag electroplating from 0.05 M AgNO3 at -0.1 V for 1 min.Cu3(HHTP)2 film electrode with Ag crystals on the MOF surface · Not reported. | SI p.25 · Supplementary data · Fig. S22 |
| Cu3(HHTP)2 film on Au/Cr/glass anode deposited at 0.25 V for 45 minresearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition; rinsed with DMF and methanol; dried under nitrogen flow.40 nm Au / 3 nm Cr / glass anode · ~900 nm | main p.2, article p.25571 · Results and Discussion · Fig. 2 |
| Cu3(HHTP)2 Au-film growth kinetics seriesresearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Potentiostatic anodic deposition at 0.25 V for 5 s to 10 h; rinsed and dried as in SI method.Au electrode · ~30 nm crystal height at 5 s; ~90 nm after 1 min; up to 10.7 um after 10 h | main p.5, article p.25574 · Results and Discussion · Fig. 4; Fig. S19 |
| Cu3(HHTP)2 coating on carbon fibresresearch_0617__mat__cu3_hhtp2 | Electrode · Target Sample · Composite | Electrochemical coating at 0.25 V.Carbon fibres · Not reported. | SI p.16 · Supplementary data · Fig. S12 |
| Cu3(HHTP)2 film on FTO electroderesearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.25 V under similar conditions.FTO electrode · Not numerically reported in text; cross-sectional SEM shown. | SI p.13 · Supplementary data · Fig. S9 |
| Cu3(HHTP)2 film on HOPG electroderesearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.25 V under similar conditions.Freshly peeled HOPG electrode · Not reported. | SI p.15 · Supplementary data · Fig. S11 |
| Cu3(HHTP)2 film on ITO electroderesearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.25 V under similar conditions.ITO electrode · Not numerically reported in text; cross-sectional SEM shown. | SI p.12 · Supplementary data · Fig. S8 |
| Patterned Cu3(HHTP)2 films on prepatterned electrodesresearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Selective electrochemical growth on conductive regions.Prepatterned conductive electrodes · Not reported. | main p.6, article p.25575 · Results and Discussion · Fig. S26a,b |
| Cu3(HHTP)2 nanorods grown in Au-coated PCTE membraneresearch_0617__mat__cu3_hhtp2 | Electrode · Target Sample · Pristine Framework | Electrochemical growth confined in PCTE pores; nanorods released after dissolving PCTE template.Au-coated polycarbonate track-etched membrane template · ~200 nm diameter and 10 um length nanorods; PCTE pore diameter 200 nm and thickness 10 um | main p.6, article p.25575 · Results and Discussion · Fig. 6 |
| Activated Cu3(HHTP)2 film pieces on Au for gas sorptionresearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Cut into small pieces and evacuated under vacuum at 100 C for 24 h before sorption.Au electrode pieces · ~10250 nm for nitrogen sorption; ~4650 nm for krypton sorption | SI p.2 · Characterization and measurements |
| Cu3(HHTP)2 film on silicon electroderesearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.25 V under similar conditions.HF-treated silicon electrode · Not numerically reported in text; cross-sectional SEM shown. | SI p.14 · Supplementary data · Fig. S10 |
| ~100 nm Cu3(HHTP)2 four-probe device on silicaresearch_0617__mat__cu3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Electrodeposited on Au-precoated silica, Au etched in I2/KI, four Au electrodes evaporated through a shadow mask; measured under vacuum.Silica glass after removal of underlying Au layer; four Au top contacts · ~100 nm MOF film; Au contacts 40 nm thick, 9000 um long, 100 um wide, 100 um spacing | SI p.4 · Device fabrication and conductivity measurement |
| Solvothermally grown Cu3(HHTP)2 film on Au electroderesearch_0617__mat__cu3_hhtp2 | Thin Film · Pristine Control · Pristine Framework | Solvothermal growth at 85 C for 18 h, rinsed with DMF and methanol, dried under nitrogen flow.Au-coated glass substrate · Not reported in text; cross-sectional SEM shown. | SI p.3 · Solvothermal synthesis of Cu3(HHTP)2 film · Fig. S7 |
| Cu2TBA film on Au electroderesearch_0617__mat__cu2_tba | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.30 V for 60 min.Au electrode · Not reported. | SI p.40 · Supplementary data · Fig. S37 |
| YbHHTP film on Au electroderesearch_0617__mat__yb_hhtp | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.25 V for 60 min.Au electrode · Not reported. | SI p.37 · Supplementary data · Fig. S34 |
| Zn3(HHTP)2 film on Au electroderesearch_0617__mat__zn3_hhtp2 | Thin Film · Target Sample · Pristine Framework | Anodic deposition at 0.30 V for 30 min.Au electrode · Not reported. | SI p.31 · Supplementary data · Fig. S28 |